2021
DOI: 10.1039/d0tc05625a
|View full text |Cite
|
Sign up to set email alerts
|

Ideal PN photodiode using doping controlled WSe2–MoSe2 lateral heterostructure

Abstract: As the tight contact interface of the lateral PN junction enables high responsivity, specific detectivity, and fast response speed, atomic-scale two-dimensional (2D) lateral PN heterostructures are emerging as viable alternatives to silicon-based photodiodes.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

2
10
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 17 publications
(12 citation statements)
references
References 40 publications
2
10
0
Order By: Relevance
“…As clearly demonstrated, the doping process causes a significant decrease in PL intensity; the PL peak arises from radiative recombination of bright excitons at the K/-K valley. The observed reduction in PL intensity is consistent with carrier doping induced by the substitutional doping reported previously. , In addition to the decrease in PL intensity, PL peaks shift to the red side, which is consistent with the previous works on substitutional Nb doping; the increase in hole density and possible strain induced by Nb doping can cause the PL red shift . Corresponding Raman spectra (Figure b), where Raman peaks arising from A′ 1 and E′ at around 250 cm −1 are seen, showing intensity reduction, also compatible with earlier works. , Typical AFM image and height profiles before and after doping (Figure c) show that the thickness of the original WSe 2 does not alter after a doping process; the formation of second layers, metallic NbSe 2 , and attachment of impurities are not observed.…”
Section: Results and Discussionsupporting
confidence: 91%
See 1 more Smart Citation
“…As clearly demonstrated, the doping process causes a significant decrease in PL intensity; the PL peak arises from radiative recombination of bright excitons at the K/-K valley. The observed reduction in PL intensity is consistent with carrier doping induced by the substitutional doping reported previously. , In addition to the decrease in PL intensity, PL peaks shift to the red side, which is consistent with the previous works on substitutional Nb doping; the increase in hole density and possible strain induced by Nb doping can cause the PL red shift . Corresponding Raman spectra (Figure b), where Raman peaks arising from A′ 1 and E′ at around 250 cm −1 are seen, showing intensity reduction, also compatible with earlier works. , Typical AFM image and height profiles before and after doping (Figure c) show that the thickness of the original WSe 2 does not alter after a doping process; the formation of second layers, metallic NbSe 2 , and attachment of impurities are not observed.…”
Section: Results and Discussionsupporting
confidence: 91%
“…X-ray photoelectron spectroscopy (XPS) has shown the existence of Nb atoms (Nb 3d peaks) and doping-induced red shifts in the W 4f and Se 3d peaks in the XPS spectra of Nb-doped WSe 2 , which is consistent with previous works (Figure S3). 20,28 Considering all results, including HAADF-STEM, EDX, PL, AFM, and XPS, it is reasonable to conclude that substitutional Nb doping, which leads to hole doping, is the dominant process in our postdoping method.…”
Section: Resultsmentioning
confidence: 85%
“…Interestingly, the addition of the top Ag sphere to the geometry further redshifts the optical bandgap by 14 meV (a total of 35 meV shift from pristine WSe 2 ). This material effect of Ag sphere onto monolayer WSe 2 has not been reported before to the best of our knowledge, and previous works have always associated redshift in PL of monolayer due to various dopants with p-doping of the material [28,[38][39][40]. Raman peak shift pattern observed matches with other work indicative of possible p-type doping of WSe 2 by our device structure; however, a conclusive result would require an electrical measurement [31].…”
Section: Resultssupporting
confidence: 86%
“…[ 29–33 ] The proficiency of these photodetectors can be improvised by employing the heterostructure architecture. [ 28,34–36 ] Furthermore, the combination of photoactive MoSe 2 and bulk semiconductor such as silicon (Si), germanium (Ge), Gallium nitride (GaN), or other compound semiconductors can provide high‐performance broadband photodetectors by exploiting the advantageous properties of both the materials. Few research groups have demonstrated the MoSe 2 /Si [ 28,37,38 ] and MoSe 2 /Ge [ 36 ] heterojunction devices that showed responsivity ranging from 270 mA W −1 at 650 nm to 35 A W −1 at 1550 nm and modest detectivity in their operational range.…”
Section: Introductionmentioning
confidence: 99%