I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking

Sugita, Hikaru; Matsumura, Nobuji

doi:10.1016/j.mee.2018.04.004

Cited by 9 publications

(3 citation statements)

References 35 publications

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“…Nevertheless, there is an interest in the development of visible-light PAGs for applications in 3D printing systems, photocurable adhesives, and incorporation in photoresists sensitive to 436 nm light (the so-called g-line 25 ). Visible-absorbing sulfonium salts 26 BODIPY 27 and especially photochromic-based derivatives 28 have been devised accordingly.…”

Section: Introductionmentioning

confidence: 99%

Arylazo Sulfones as Nonionic Visible-Light Photoacid Generators

et al. 2022

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The selective visible-light-driven generation of a weak acid (sulfinic acid, in nitrogen-purged solutions) or a strong acid (sulfonic acid, in oxygen-purged solutions) by using shelf-stable arylazo sulfones was developed. These sulfones were then used for the green, smooth, and efficient photochemical catalytic protection of several (substituted) alcohols (and phenols) as tetrahydropyranyl ethers or acetals.

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Section: Introductionmentioning

confidence: 99%

Arylazo Sulfones as Nonionic Visible-Light Photoacid Generators

et al. 2022

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“…The photoresist layer of DFRs generally composed of resins, monomers, oligomers, photoinitiators, dyes and other additives. [109][110][111] Resin possesses the largest mass ratio in all components of DFRs, and directly determines the resolution, adhesiveness, developing time and flexibility, etc. the most commonly-used PIs for DFRs are hexarylbiimidazole (HABIs) compounds, [43] among which 2,2-bis(2-chlorophenyl)-4,4,5,5tetraphenyl-1,2-biimidazole (BCIM) has been broadly employed due to its merits of good efficiency and discoloration property.…”

Section: Pcb Dry Film Photoresistmentioning

confidence: 99%

Introduction of Photopolymerization Technology and Application

Zang²,

Xin³

et al. 2023

Preprint

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Photopolymerization as an energy-saving and environment-friendly technology has been applied in many fields and developed continuously since the middle of the 20th century. Today, photopolymerization technology is ubiquitous in every aspect of our lives. This review starts from the principle of photopolymerization reaction, introduces the process of photopolymerization, initiation mechanism of photoinitiators and three kinds of polymerization methods according to the wavelength of irradiation source. Subsequently, review focuses on the application of photopolymerization technology in thiol-based click reaction, 3D printing, photoresist, hydrogels and other fields, so as to demonstrate its irreplaceable role in the present.

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“…Photoresist is a pivotal material in the PCB including photoreceptor resin, photoinitiator, solvents, and additives, which can transfer the necessary fine circuit from film to the substrate after screen printing, exposure, development, etching, stripping (DES), and other photolithography processes. However, most photoresists are organic solvent-based. − These photoresists emit high levels of volatile organic compounds (VOCs) and incur environmental costs. Moreover, it poses a threat to operators in terms of health and safety that VOCs have been linked to symptoms such as drowsiness, headaches, and vertigo. − Prolonged exposure to high levels of VOCs may lead to respiratory diseases, cancer, and fatalities. , To address these concerns, waterborne photoresists have emerged as a research and development hotspot in recent years.…”

Section: Introductionmentioning

confidence: 99%

Assisted Preparation of Waterborne Anti-etching Coating for Printed Circuit Board Photoresist Using Dibenzoyl Peroxide/Copper(II)-Phthalocyanine at Room Temperature

Xu,

Li,

Wang

et al. 2023

ACS Appl. Polym. Mater.

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The waterborne printed circuit board (PCB) photoresist is a photopolymer material that offers several environmental advantages over traditional solvent-borne PCB photoresists, including low pollution, low volatility, and easy cleaning, which can effectively reduce occupational health risks. This paper presents a simple stirring-resting step-reaction at room temperature and atmospheric environment to achieve the cross-linking copolymerization of waterborne acrylic resin with trimethylolpropane triacrylate (TMPTA) through the self-decomposition reaction of dibenzoyl peroxide (BPO) with copper(II)-phthalocyanine (CuPc). Subsequently, a modified resin with both thermosetting and photosetting properties was formulated to produce a waterborne eco-friendly PCB photoresist with low volatile organic compounds (VOCs). The photoresist exhibits good water solubility and can be diluted to a maximum of 12% water content while ensuring a resolution of 35 μm. Additionally, the printing performance and rheological characteristics of photoresists with different TMPTA ratios and water contents were analyzed. It was found that the photoresist exhibited the best-related performances when the ratio of acrylic resin to TMPTA was 3:7 and the water content was 9%. This formulation requires readily available raw materials, low production equipment requirements, and simple operation and is suitable for mass production.

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I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking

Cited by 9 publications

References 35 publications

Arylazo Sulfones as Nonionic Visible-Light Photoacid Generators

Arylazo Sulfones as Nonionic Visible-Light Photoacid Generators

Introduction of Photopolymerization Technology and Application

Assisted Preparation of Waterborne Anti-etching Coating for Printed Circuit Board Photoresist Using Dibenzoyl Peroxide/Copper(II)-Phthalocyanine at Room Temperature

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