2015
DOI: 10.1088/0953-2048/28/2/024006
|View full text |Cite
|
Sign up to set email alerts
|

In situstudy through electrical resistance of growth rate of trifluoroacetate-based solution-derived YBa2Cu3O7films

Abstract: In this work, we have studied by means of in situ electrical measurements the nucleation, growth and sintering stages of epitaxial YBa 2 Cu 3 O 6+δ (YBCO) superconducting thin films prepared using a chemical solution deposition approach based on metal-organic trifluoroacetate-based (TFA) precursors. Single crystal substrates (LaAlO 3 and CeO 2 /YSZ) were used in this study. Analysis of isothermal time dependences, at different temperatures, of in situ electrical resistance of films allowed to evidence that the… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
26
0

Year Published

2015
2015
2022
2022

Publication Types

Select...
8

Relationship

1
7

Authors

Journals

citations
Cited by 21 publications
(27 citation statements)
references
References 65 publications
1
26
0
Order By: Relevance
“…This allows the estimation of the YBCO growth rate along the c-axis. We have estimated for our FH films that the growth rates at P(H 2 O) = 23 mbar are 0.47 nm s À1 and 0.32 nm s À1 , at 810 1C and 750 1C, respectively, in agreement with the values determined in films grown by CTA, 46,47 deduced in both cases from in situ resistance measurements. 211, respectively, while the samples were quenched at 810 1C in a dry gas atmosphere (blue ), at 810 1C in a humid gas atmosphere (black K) and at 750 1C in a humid gas atmosphere (red ) after annealing for selected time periods.…”
Section: Resultssupporting
confidence: 87%
See 1 more Smart Citation
“…This allows the estimation of the YBCO growth rate along the c-axis. We have estimated for our FH films that the growth rates at P(H 2 O) = 23 mbar are 0.47 nm s À1 and 0.32 nm s À1 , at 810 1C and 750 1C, respectively, in agreement with the values determined in films grown by CTA, 46,47 deduced in both cases from in situ resistance measurements. 211, respectively, while the samples were quenched at 810 1C in a dry gas atmosphere (blue ), at 810 1C in a humid gas atmosphere (black K) and at 750 1C in a humid gas atmosphere (red ) after annealing for selected time periods.…”
Section: Resultssupporting
confidence: 87%
“…respectively. These time periods are significantly decreased (by factors 3-5) as compared to the films grown by the CTA heating route, as detected by in situ electrical conductance measurements 39,46,47 or X-ray diffraction. 36,39 Very likely, the fundamental reason for such a reduced incubation time is the smaller atomic diffusion lengths needed to form stable nuclei which then enhances the nucleation rate.…”
Section: Resultsmentioning
confidence: 95%
“…1) has been reached at the present growth rate [62]. Of course, an equivalent approach to trap small nanoparticles is, as suggested by eq.…”
Section: Growth and Characterization Of Nanocompositesmentioning
confidence: 84%
“…The subsequent pyrolysis and growth processes are also described elsewhere. [93][94][95] The phase analysis of the YBCO films was performed by X-ray diffraction using a Bruker AXS GADDS diffractometer equipped with a 2D detector. The lattice parameters were determined using a Siemens model D-5000 X-ray diffractometer with a step size of 0.011.…”
Section: Methodsmentioning
confidence: 99%
“…The films conductance was determined by electrical measurements carried out using a standard system reported elsewhere. 18,19,95,96 It consists of a 4-probe contact in a Van der Pauw configuration. The sample is held in the center of a 22 mm furnace tube that allows controlling the temperature and gas atmosphere.…”
Section: Methodsmentioning
confidence: 99%