In Situ Plasma Analysis, Fluorine Incorporation, Thermostability, Stress, and Hardness Comparison of Fluorinated Amorphous Carbon and Hydrogenated Amorphous Carbon Thin Films Deposited on Si by Plasma Enhanced Chemical Vapor Deposition

Abstract

In situ observation of the plasma properties during deposition of fluorinated amorphous hydrogenated carbon (FLAC) and unfluorinated amorphous hydrogenated carbon are performed. The relationship between film properties and impinging ion energy and incident ion momentum is discussed within the framework of existing models of diamond-like carbon (DLC) formation. The DLC films are deposited in a low pressure radio frequency discharge operating at 13.57 MHz with methane and carbon tetra-fluoride as the source gases. Thermostability, stress, and mechanical properties are investigated. The films are elevated to 400 degrees C in order to investigate thermostability. Thin film stress and nano-hardness are also studied. The film density is investigated by gravimetric methods. The fluorinated film stoichiometry is explored with x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy.