<i>Atomic Spectra in the Vacuum Ultraviolet from 2250 to 1100 Å</i>

Junkes, J.; Salpeter, E. W.; Milazzo, G.; Kiess, C. C.

doi:10.1063/1.3047039

Cited by 10 publications

(13 citation statements)

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“…For hydrogen, the increase is partly due to the strong atomic hydrogen line at 121.6 nm but is mainly due to the thousands of molecular hydrogen lines that occur between 80 and 165 nm. 43,44 These lines merged into a ragged ''background level'' in our spectra and we simply averaged that background level to determine the VUV flux from the H 2 emissions. Table V compares intensities at the wafer as calculated from side-view and through-the-wafer view measurements using Eq.…”

Section: Resultsmentioning

confidence: 99%

Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges

Woodworth

Riley

Amatucci

et al. 2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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@In this paper, we report the absolute intensities of ultraviolet light between 4.9 eV and 24 eV ( 250 m-n to 50 mn ) striking a silicon wafer in a number of oxide-etch processing discharges. Our emphasis is on photons with energies greater than 8.8 eV, which have enough energy to damage Si02. These discharges were in an inductively-driven Gaseous Electronics Conference reference cell which had been modified to more closely resemble commercial etching tools. Comparisons of measurements made through a side port in the cell and through a hole in the wafer indicate that the VUV light in these discharges is strongly trapped. For the pure halocarbon gases examined in these experiments ( CzF& CHF3, C4F8 ), the fluxes of VUV photons to the wafer varied fi'om 1 x 1015 to 3 x 1015photons/cm2sec or equivalently from 1.5 to 5 mW/cm2. These measurements imply that O.10/0to 0.3 0/0 of the rf source power to these discharges ends up hitting the wafer as VUV photons for our typical 20 mT, 200 W rf discharges. For typical "ashing" discharges containing pure oxygen, the VUV intensities are slightly higher -about 8 mW/cm2 . As argon or hydrogen diluents are added to the fluorocarbon gases, the VUV intensities increase dramatically, with a 10/1 0/1 Omixture of Ad C2F~H2yielding VUV fluxes on the wafer 26 mW/cm2 and pure argon discharges yielding 52 mWlcm2 . Adding an rf bias to the wafer had only a small effect on the VUV observed through a side-port of the GEC cell.

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Section: Resultsmentioning

confidence: 99%

Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges

Woodworth

Riley

Amatucci

et al. 2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…VUV transition arrays of C I were observed in many laboratory sources (Fowler & Selwyn 1928;Paschen & Kruger 1930;Edlén 1933b;Wilkinson 1955;Herzberg 1958;Wilkinson & Andrew 1963;Kaufman & Ward 1966;Junkes et al 1965;Mazzoni et al 1981), as well as in several solar prominences (Sandlin et al 1986;Feldman & Doschek 1991;Curdt et al 2001;Parenti et al 2005;Feldman et al 1976). These measurements were compared with Ritz wavelengths (accurate to better than 0.0003 Å) generated using long-wavelength FTS measurements in combination with several VUV lines precisely measured with an FTS (see Sections 2.1-2.5).…”

Section: Observations Of Vuv Transition Arraysmentioning

confidence: 99%

“…Its results were tabulated in her Atomic Energy Levels (AEL) book (Moore 1970), which is hereafter referred to as Moore's table. Her work was largely based on Johansson (1966), but the level values were slightly improved by taking into account a few good VUV measurements by Kaufman & Ward (1966), and intensities of lines in VUV region were from photographic examinations (Junkes et al 1965). Moore's table includes more than 300 Ritz wavelengths of VUV lines, out of which 190 were previously observed.…”

Section: Introductionmentioning

confidence: 99%

Critically Evaluated Spectral Data for Neutral Carbon (${\rm{C}}\,{\rm{I}}$)

Haris¹,

Kramida²

2017

ApJS

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ABSRACT In this critical compilation, all known to us experimental data on the spectrum of neutral carbon were methodically evaluated and supplemented by parametric calculations with Cowan's code. The sources of experimental data vary from laboratory to astrophysical objects and employ different instrumentation from classical grating and Fourier transform spectrometers to precise laser spectroscopy setups and various other modern techniques. This comprehensive evaluation provides accurate atomic data on energy levels and wavelengths (observed and Ritz) with their estimated uncertainties, as well as a uniform description of observed line intensities. In total, 412 energy levels were optimized with the help of selected 1221 best observed lines participating in 1365 transitions in the wavelength region 750 Å to 609.14 µm. In addition, 737 possibly observable transitions are predicted. Critically evaluated transition probabilities for 1616 lines are provided, of which 241 are new. With the accurate energy levels obtained,combined with additional observed data on high Rydberg states, the ionization limit was determined to be 90 820.348(9) cm −1 or 11.2602880(11) eV in fair agreement with the previously recommended value, but more accurate.

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“…5 Briefly, the hydrogen pseudocontinuum was used as a photon source, with known reference emission lines used to internally calibrate the absolute photon energy scale to better than 0.001 eV. 6 the resolution of the windowless Seya-Namioka monochromator was fixed at 0.15 nm for all experiments. Photoion count rates in the threshold region varied with each compound and ranged from approximately 2.5 s -1 for acetophenone to 0.3 s -1 for n-propyl phenyl ketone.…”

Section: Introductionmentioning

confidence: 99%