Hysteresis effect in reactive R.F. sputtering and the adjusyment of the set point for stoichiometric film deposition

Seifarth, H.

doi:10.1016/0040-6090(89)90118-1

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Hysteresis effect in reactive R.F. sputtering and the adjusyment of the set point for stoichiometric film deposition

Cited by 9 publications

References 15 publications

The Effect of Substrate Temperature on the Structure and Morphology of Titanium Nitride Compounds Grown by DC Magnetron Sputtering

The Effect of Substrate Temperature on the Structure and Morphology of Titanium Nitride Compounds Grown by DC Magnetron Sputtering

Characterization of a TiN deposition process based on structural studies, plasma diagnostics and mathematical modelling

Hard Coatings Prepared by Sputtering and Arc Evaporation

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