“…In other studies laser annealing has been used following the ion implantation of a specific atom impurity into another substance. These studies include Fe in Si (172), Te in GaAs, GaSb, GaP, and InP (324), and Sb, Te, and I in Ge and Si (67,72,68). There have been many papers published which involve ion implantation during the last 2 years.…”