Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum

Ji, Hong; Cote, A.; Koshel, D.; Terreault, B.; Abel, G.; Dauphin‐Ducharme, Philippe; Ross, Graham G.; Savoie, S.; Gagné, Michel R.

doi:10.1016/s0040-6090(01)01707-2

Cited by 33 publications

(14 citation statements)

References 15 publications

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“…Plasma Enhanced Chemical Vapor Deposition (PECVD) can produce diamondlike coatings (DLC) through the ionization and radicalization of a feeding gas that can be C 2 F 6 [72]. Highly reactive radical species such as CF 2…”

Section: Low Surface Energy Coatingsmentioning

confidence: 99%

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Advanced Icephobic Coatings

Menini

Farzaneh

2011

Journal of Adhesion Science and Technology

142

101

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Section: Low Surface Energy Coatingsmentioning

confidence: 99%

“…Recent studies have demonstrated the potential of ultra thin films based on DLC associated with a fluorocarbon gas [72][73][74][75][76]. These coatings produced by common PECVD technology, exhibit high hydrophobicity with high adhesion to aluminum and porcelain, and good mechanical properties.…”

Section: Low Surface Energy Coatingsmentioning

confidence: 99%

Advanced Icephobic Coatings

Menini

Farzaneh

2011

Journal of Adhesion Science and Technology

142

101

View full text Add to dashboard Cite

“…27 For this purpose, a F/C ratio of Ͻ1 yielded the best mechanical ͑high hardness͒ and surface properties ͑rough, hydrophobic͒. Ji et al used Ar/C 2 H 2 /C 3 F 8 to deposit hydrophobic FC coatings for porcelain insulators and Al conductors.…”

Section: A C 3 Fmentioning

confidence: 99%

Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas

Martin

Malkov

Butoi

et al. 2004

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C 4 F 8 ∕ Ar and C F 4 ∕ H 2 based capacitively coupled plasmas Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers Materials deposited in continuous wave ͑cw͒ and pulsed low-pressure octafluoropropane (C 3 F 8 ) and octafluorocyclobutane (c-C 4 F 8 ) plasmas were characterized using Fourier transform infrared spectroscopy ͑FTIR͒, x-ray photoelectron spectroscopy, static contact angle measurements, spectroscopic ellipsometry, and scanning electron microscopy ͑SEM͒. Fluorocarbon ͑FC͒ materials deposited in pulsed plasmas were less crosslinked than those deposited in cw plasmas with equivalent input powers. Within each system, higher F/C ratio materials were deposited by lowering the plasma input power/duty cycle. Using downstream depositions had a similar effect on film composition, but also resulted in decreased deposition rates. SEM analysis showed that decreases in the flexibility of the fluorocarbon films were correlated with increases in the percent of crosslinking. Additionally, the smoothness of the film surfaces suggests that polymerization processes occur on the substrate surface. Overall, films deposited in C 4 F 8 plasmas were more crosslinked and less flexible than those deposited in C 3 F 8 plasmas under the same conditions. The composition of the deposited FC films is correlated to the nature and relative concentrations of nascent ions previously measured in these plasma systems using plasma ion mass spectrometry.

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“…In a related paper on fluorocarbon coatings, Ji et al [5] were able to deposit hydrophobic multilayer CF x coatings on aluminum using a benign Ar/C 2 H 2 /C 3 F 8 chemistry in a sputtering/plasma-enhanced chemical vapor deposition system. The degree of hydrophobicity was observed to depend both on the fluorine content of the coating and the surface morphology.…”

Section: Introductionmentioning

confidence: 99%

Creating micro-scale surface topology to achieve anisotropic wettability on an aluminum surface

Sommers

Jacobi

2006

J. Micromech. Microeng.

126

104

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A technique for fabricating micropatterned aluminum surfaces with parallel grooves 30 µm wide and tens of microns in depth is described. Standard photolithographic techniques are used to obtain this precise surface-feature patterning. Positive photoresists, S1813 and AZ4620, are selected to mask the surface, and a mixture of BCl 3 and Cl 2 gases is used to perform the etching. Experimental data show that a droplet placed on the micro-grooved aluminum surface using a micro-syringe exhibits an increased apparent contact angle, and for droplets condensed on these etched surfaces, more than a 50% reduction in the volume needed for the onset of droplet sliding is manifest. No chemical surface treatment is necessary to achieve this water repellency; it is accomplished solely by an anisotropic surface morphology that manipulates droplet geometry and creates and exploits discontinuities in the three-phase contact line. These micro-structured surfaces are proposed for use in a broad range of air-cooling applications, where the management of condensate and defrost liquid on the heat transfer surface is essential to the energy-efficient operation of the machine.(Some figures in this article are in colour only in the electronic version)

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Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum

Cited by 33 publications

References 15 publications

Advanced Icephobic Coatings

Advanced Icephobic Coatings

Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas

Creating micro-scale surface topology to achieve anisotropic wettability on an aluminum surface

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