Hydrophobic coating of silicate phosphor powder using atmospheric pressure dielectric barrier discharge plasma

Trinh, Quang Hung; Lee, Sang Baek; Mok, Young Sun

doi:10.1002/aic.14356

Cited by 12 publications

(8 citation statements)

References 26 publications

(35 reference statements)

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“…On the basis of the above discussions and results reported in the literature, [ 12,26,61,101,102 ] the predominant plasma‐chemical reaction pathway for the combined HMDSO activation reactions in plasma‐state polymerization can be proposed on the basis of electron impact yielding the film‐forming species, • (CH 3 ) 2 SiO • :

{({CH}_{3})}_{3} SiOSi {({CH}_{3})}_{3} + normale \to^{•} {({CH}_{3})}_{2} {SiO}^{•} + {({CH}_{3})}_{3} {Si}^{•} +^{•} {CH}_{3} + normale,

…”

Section: Resultsmentioning

confidence: 99%

Plasma polymerization of hexamethyldisiloxane: Revisited

Hegemann

Bülbül

Hanselmann

et al. 2020

Plasma Processes & Polymers

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Activation reactions of molecules in plasma are investigated using plasma polymerization of hexamethyldisiloxane as a model system for plasma‐state polymerization. Underlying reaction pathways and film‐forming mechanisms are revisited based on a simplified macroscopic approach, considering the average energy available per monomer particle, Epl, in relation to the threshold energy, Eth, which represents an activation barrier for plasma polymerization. Basic principles are discussed involving averaged values for collision frequency, cross‐section, and reaction rate to produce film‐forming species combining macroscopic and microscopic quantities. Considering the energy uptake from the electric field by the electrons, the energy transfer from electrons to monomer molecules, and the conversion into film‐forming species, it is demonstrated that Epl/Eth is equally relevant as the electron energy distribution function for plasma‐chemical activation reactions.

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{({CH}_{3})}_{3} SiOSi {({CH}_{3})}_{3} + normale \to^{•} {({CH}_{3})}_{2} {SiO}^{•} + {({CH}_{3})}_{3} {Si}^{•} +^{•} {CH}_{3} + normale,

…”

Section: Resultsmentioning

confidence: 99%

Plasma polymerization of hexamethyldisiloxane: Revisited

Hegemann

Bülbül

Hanselmann

et al. 2020

Plasma Processes & Polymers

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“…The aging time was reported to have a significant effect on WCA for the powder substrate coating [23]. Trinh et al [23] have reported that the WCA could increase by 15-40°within 30 days in the case of powder substrate coating.…”

Section: Coating Stability Testmentioning

confidence: 99%

Robust hydrophobic coating on glass surface by an atmospheric-pressure plasma jet for plasma-polymerisation of hexamethyldisiloxane conjugated with (3-aminopropyl) triethoxysilane

Hossain

Trinh

Nguyen

et al. 2019

Surface Engineering

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Plasma polymerisation of hexamethyldisiloxane (HMDSO) and (3-aminopropyl)triethoxysilane (APTES) was attempted to form a robust hydrophobic coating film on glass surface. Although HMDSO is a common precursor for generating hydrophobic surface, the HMDSO-polymerised thin film is poor in strength. For the purpose of achieving the mechanical robustness of the coating, APTES was used together with HMDSO. Plasma polymerisation was performed using a dielectric barrier discharge plasma jet by varying the ratio of the two precursors to find a suitable condition that would produce robust hydrophobic thin film. Various instrumental techniques were used to characterise the coating layer. As a result of the examination of the hydrophobicity through the water contact angle measurements and the robustness by the scratch tests, the most reasonable coating was achieved at the HMDSO/APTES ratio of 3/1, the voltage of 7 kV and the treatment time of 60 s, and at this condition the WCA was 143°.

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“…Based on a brief analysis of XPS and FTIR, the process of decomposition of monomer was shown in reaction I [37]. During plasma discharge, argon is ionized by a dualfrequency power source at atmospheric pressure and it will [38]. It should be noted that reaction I is only the fundamental mechanism, and more detailed and complicated reactions simultaneously occur in the plasma system.…”

Section: Film Characterization Techniquesmentioning

confidence: 99%

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet

Li¹,

Yuan²,

Chang³

et al. 2017

Plasma Sci. Technol.

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The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency (50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated. The topography was measured by using scanning electron microscopy. The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy. The results indicated that the as-deposited film was constituted by silicon, carbon, and oxygen elements, and FTIR suggested the films are organosilicon with the organic component (-CH x) and hydroxyl functional group(-OH) connected to the Si-O-Si backbone. Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester. Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.

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Hydrophobic coating of silicate phosphor powder using atmospheric pressure dielectric barrier discharge plasma

Cited by 12 publications

References 26 publications

Plasma polymerization of hexamethyldisiloxane: Revisited

Plasma polymerization of hexamethyldisiloxane: Revisited

Robust hydrophobic coating on glass surface by an atmospheric-pressure plasma jet for plasma-polymerisation of hexamethyldisiloxane conjugated with (3-aminopropyl) triethoxysilane

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet

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