Toxic
doping gases are usually used to produce hydrogenated amorphous
silicon (a-Si:H) layers in thin-film solar cells (TFSCs). Hence, an
alternative structure that avoids the use of toxic gases is desirable.
In this work, we replaced both the p-type-a-Si:H
and n-type-a-Si:H layers simultaneously in a normal
TFSC to form a structure that is dopant-free. Molybdenum oxide (MoO3) and lithium fluoride were used as the p-type and n-type layers, respectively. The effects
of the deposition method and the thickness of the MoO3 layer
on the device performance were investigated. The power-conversion
efficiency of the optimized hybrid solar cell reached a maximum of
7.08%, which is remarkable considering the novel structure of the
dopant-free devices. The light stability of the devices with and without
MoO3 was also compared: the light stability of the device
with MoO3 was found to be much better than that of the
device without MoO3 and with p-i-n Si
layers. This was ascribed to the insignificant number of defect sites
generated by the nondoping elements, which led to a less contaminated,
more compact, and smoother oxide surface, resulting in an increase
in the electron lifetime and improved light stability. This work opens
up a new direction toward the development of a truly dopant-free device
that does not involve the use of toxic gases during fabrication and
provides the potential for further enhancement of the efficiency of
future dopant-free solar cells.