2009
DOI: 10.1143/jjap.48.122402
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Hydrogenated Amorphous Silicon Oxide Solar Cells Fabricated near the Phase Transition between Amorphous and Microcrystalline Structures

Abstract: We investigated the properties of hydrogenated amorphous silicon oxide (a-Si 1Àx O x :H) deposited near the phase transition between amorphous and microcrystalline structures. a-Si 1Àx O x :H films were prepared by plasma-enhanced chemical vapor deposition using a gas mixture of silane, hydrogen, and carbon dioxide. The film structure was changed from amorphous to microcrystalline phase by increasing hydrogen dilution. Optical and electrical characterizations revealed that wide-gap a-Si 1Àx O x :H films were d… Show more

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Cited by 45 publications
(34 citation statements)
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“…[2][3][4][5][6][7] Not only do a-Si:H layers suffer from LID, but amorphous silicon alloys such as amorphous silicon carbide (a-SiC:H) and amorphous silicon oxide (a-SiO:H) also degrade. [8][9][10] Both carbon and oxygen are often used to widen the bandgap of intrinsic or doped amorphous silicon-and there is no reason why alloys using them would not degrade when they are boron doped.…”
mentioning
confidence: 99%
“…[2][3][4][5][6][7] Not only do a-Si:H layers suffer from LID, but amorphous silicon alloys such as amorphous silicon carbide (a-SiC:H) and amorphous silicon oxide (a-SiO:H) also degrade. [8][9][10] Both carbon and oxygen are often used to widen the bandgap of intrinsic or doped amorphous silicon-and there is no reason why alloys using them would not degrade when they are boron doped.…”
mentioning
confidence: 99%
“…Rather high flow rate of hydrogen (H 2 ) was also included in the gas mixture in order to reduce the defect density in the material, which increases with oxygen concentration [6]. The H 2 dilution has to be carefully controlled to obtain device-quality a-SiO x :H with a wide bandgap.…”
Section: A-sio X :H As Wide Bandgap Absorbermentioning
confidence: 99%
“…This can be attributed to the bandgap widening that causes a reduction of the photogenerated carrier density. However, since σ L is proportional to the mobility-lifetime product of the generated carriers, its reduction could be also ascribed to an enhanced content of defects acting as recombination sites, caused by the incorporation of oxygen atoms [6].…”
Section: A-sio X :H As Wide Bandgap Absorbermentioning
confidence: 99%
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“…Moreover, the refractive index and the electronic band gap and, thus, the optical absorption of the material can be varied by alloying of the material with carbon and oxygen, e.g. by the admixture of CH 4 or CO 2 to the process gas [9][10][11][12][13]. Due to the a e-mail: onno.gabriel@helmholtz-berlin.de wide spread and large variety of applications of these films the growth mechanism of thin film silicon is the topic of ongoing research.…”
Section: Introductionmentioning
confidence: 99%