2005
DOI: 10.1016/j.snb.2004.11.092
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Hydrogen sensing characteristics of WO3 thin film conductometric sensors activated by Pt and Au catalysts

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Cited by 185 publications
(83 citation statements)
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“…In metal oxide sensors, the electrical resistance of the film changes when exposed to a target gas. Also, among metal oxides, WO 3 is widely used to detect many gases like H 2 , H 2 S, NO 2 and VOC [20][21][22][23]. Moreover, it has been shown that the addition of an appropriate amount of noble metal additives promotes chemical reactions by reducing activation energy between the surface of metal oxide and target gas.…”
Section: Open Accessmentioning
confidence: 99%
“…In metal oxide sensors, the electrical resistance of the film changes when exposed to a target gas. Also, among metal oxides, WO 3 is widely used to detect many gases like H 2 , H 2 S, NO 2 and VOC [20][21][22][23]. Moreover, it has been shown that the addition of an appropriate amount of noble metal additives promotes chemical reactions by reducing activation energy between the surface of metal oxide and target gas.…”
Section: Open Accessmentioning
confidence: 99%
“…In principle, MOS sensors would utilize changes in the resistance of a sensing layer to detect the presence of a gas. The most frequently investigated oxide semiconductors for gas sensing applications include SnO 2 [2][3][4], ZnO [5,6], WO 3 [7][8][9], and TiO 2 [10][11][12]. In the present work, we utilize the extraordinary hydrogen-induced metallization [13] that occurs in ZnO to produce a high-performance H 2 sensor with high selectivity.…”
Section: Introductionmentioning
confidence: 99%
“…We have considered a literary review of works and publications on the gas-sensitive characteristics of various sensor structures in gas mixtures of air with hydrogen [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. The interest of authors of the works has been concentrated on the search of catalytic additives to tin dioxide and search of new semiconductive metal oxides.…”
Section: Introductionmentioning
confidence: 99%