2004
DOI: 10.1016/j.snb.2003.12.011
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Hydrogen sensing characteristics of a Pt–oxide–Al0.3Ga0.7As MOS Schottky diode

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Cited by 35 publications
(24 citation statements)
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“…Our SBHs obtained by the I-V and C-V measurements are consistent with the reported values of 0.61 À 0.86 eV for n-InGaN-based Schottky diodes and 0.66 À0.98 eV for n-GaN-based Schottky diodes made by MOCVD [2,5]. Some reported SBHs showed a big change after annealing [6,7,12]; our SBH was relatively stable after annealing at 400 1C. The obtained electrical parameters from our MOS Schottky diode made all by sputtering are compatible to those from MS and MOS devices made by MOCVD and other approaches [2][3][4][5][6][7][8][9][10][11][12].…”
Section: Tablesupporting
confidence: 91%
See 3 more Smart Citations
“…Our SBHs obtained by the I-V and C-V measurements are consistent with the reported values of 0.61 À 0.86 eV for n-InGaN-based Schottky diodes and 0.66 À0.98 eV for n-GaN-based Schottky diodes made by MOCVD [2,5]. Some reported SBHs showed a big change after annealing [6,7,12]; our SBH was relatively stable after annealing at 400 1C. The obtained electrical parameters from our MOS Schottky diode made all by sputtering are compatible to those from MS and MOS devices made by MOCVD and other approaches [2][3][4][5][6][7][8][9][10][11][12].…”
Section: Tablesupporting
confidence: 91%
“…Some reported SBHs showed a big change after annealing [6,7,12]; our SBH was relatively stable after annealing at 400 1C. The obtained electrical parameters from our MOS Schottky diode made all by sputtering are compatible to those from MS and MOS devices made by MOCVD and other approaches [2][3][4][5][6][7][8][9][10][11][12].…”
Section: Tablementioning
confidence: 67%
See 2 more Smart Citations
“…The first gas sensor based on MIS technology is attributed to Lundström et al [1], who in 1975 reported a hydrogen-sensitive Pd-MOS transistor fabricated on conventional silicon (Si) substrate. Later, the introduction of wide band-gap semiconductors, such as SiC, group-III nitrides (AlN, GaN and AlGaN) and diamond, made possible the increase of the operating temperature of the device above that of Si (limited to below 250 • C) [2][3][4][5]. The higher operating temperature allows the devices to work nearer the source of the hazardous gases, which are usually produced in high temperature conditions.…”
Section: Introductionmentioning
confidence: 99%