Hydrogen Fluoride Vapor Etching of SiO2 Sacrificial Layer with Single Etch Hole

Kim, Chayeong; Noh, Eunsik; Shin, Kumjae; Moon, Wonkyu

doi:10.46670/jsst.2023.32.5.328

KSS

2023

DOI: 10.46670/jsst.2023.32.5.328

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Hydrogen Fluoride Vapor Etching of SiO2 Sacrificial Layer with Single Etch Hole

Chayeong Kim,

Eunsik Noh,

Kumjae Shin

et al.

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Hydrogen Fluoride Vapor Etching of SiO2 Sacrificial Layer with Single Etch Hole

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References 13 publications

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