1991
DOI: 10.1063/1.105772
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Hydrogen diffusivities below room temperature in silicon evaluated from the photoinduced dissociation of hydrogen–carbon complexes

Abstract: We have evaluated hydrogen and deuterium diffusivities in silicon below room temperature (220–270 K) by analyzing the kinetics of photoinduced dissociation of a chemical etching introduced hydrogen (deuterium)–carbon complex. Under sufficiently strong illumination, the annihilation rate of the complex was proportional to the phosphorus density, indicating that the rate-determining step is the diffusion of hydrogen (deuterium) to phosphorus atoms. Applying the diffusion-controlled reaction theory, we have evalu… Show more

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Cited by 29 publications
(18 citation statements)
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“…12 The diffusion coefficients can be classified into two groups, if temperature dependence is applied as a criterion. Above 200 K our data points are quite compatible with data reported by Seager, Anderson, and Brice, 7 Tavendale, Williams, and Pearton, 8 Kamiura, Yoneta, and Hashimoto, 9 and extrapolated from the high-temperature regime of vWW. 1 Below 200 K the temperature dependence of the diffusion coefficient, however, is drastically reduced, indicating a different transport mechanism.…”
Section: Resultssupporting
confidence: 91%
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“…12 The diffusion coefficients can be classified into two groups, if temperature dependence is applied as a criterion. Above 200 K our data points are quite compatible with data reported by Seager, Anderson, and Brice, 7 Tavendale, Williams, and Pearton, 8 Kamiura, Yoneta, and Hashimoto, 9 and extrapolated from the high-temperature regime of vWW. 1 Below 200 K the temperature dependence of the diffusion coefficient, however, is drastically reduced, indicating a different transport mechanism.…”
Section: Resultssupporting
confidence: 91%
“…48͒ to be compared with the measured one of E a ϭ0.5 eV. 1,[7][8][9] It was recently also proposed for tunneling by Herrero. 13 Since it is not a straight path, it has to be ruled out for direct tunneling transitions because of the violation of momentum conservation.…”
Section: A High Temperature Regimementioning
confidence: 99%
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“…In this work the diffusion-related kinetics of H released from photo-induced dissociation of carbon-hydrogen complexes near the surface of the silicon (formed via wet-etching) was measured in the range T = 220-270 K, leading to a diffusivity D = (7 × 10 −2 cm 2 /s) exp(−0.54 eV/k B T ). This result was claimed to reflect a rate-limiting process involving the diffusion of hydrogen to phosphorous atoms [25].…”
Section: Introductionmentioning
confidence: 99%
“…The large scatter in data for diffusion of hydrogen through silicon 148,[196][197][198][199][200][201][202][203][204][205][206][207][208][209][210][211][212][213][214] . We have only plotted data for hydrogen diffusion (no isotopes) and have indicated the type of silicon where known.…”
Section: Noble Gasesmentioning
confidence: 99%