2012
DOI: 10.1039/c2jm32111d
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Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

Abstract: We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd 2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be obtained. Moreover, this work is the first experimental demonstration of hydrogen adsorption on Pd adlayers.

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Cited by 8 publications
(12 citation statements)
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References 29 publications
(41 reference statements)
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“…39 Variations of the technique involve electrochemical reduction in low metal salt concentration 40 or the use of molecular hydrogen for a gentler reduction. 41 The concept was extended to more complicated structures such as a Pt-pyS-Pd-pyS-Au double-decker 42 and different linkers such as thiazole 43 or pyridine-terminated araliphatic thiols. 40,44 Here we use the Kolb method to prepare transition metal− pyS−gold junctions on SERS-active roughened gold and also investigate metal ions complexed to 4-mercaptopyridine adsorbed at gold nanoparticles.…”
mentioning
confidence: 99%
“…39 Variations of the technique involve electrochemical reduction in low metal salt concentration 40 or the use of molecular hydrogen for a gentler reduction. 41 The concept was extended to more complicated structures such as a Pt-pyS-Pd-pyS-Au double-decker 42 and different linkers such as thiazole 43 or pyridine-terminated araliphatic thiols. 40,44 Here we use the Kolb method to prepare transition metal− pyS−gold junctions on SERS-active roughened gold and also investigate metal ions complexed to 4-mercaptopyridine adsorbed at gold nanoparticles.…”
mentioning
confidence: 99%
“…Patterning of Pd/Cu layer. It has been reported in previous STM studies of Pd deposition on top of pyridine terminated SAMs 25,31 that metal nanoparticles adhere very weakly to the SAM. The same also holds for the PdCu particles which combines favourably with the possibility to deposit them at high density as this offers the possibility of lithographic patterning and generating metallic nanostructures.…”
Section: Resultsmentioning
confidence: 92%
“…For this reason the second, much less explored deposition scheme is of interest as it relies on the chemical functionality of SAM molecules, thus promising a more active control of the deposition process. The key point is the electrochemical reduction of ions coordinated to a SAM which, similar to protocols where reduction is accomplished chemically, [22][23][24][25] follows a complexation step without potential control as illustrated in Figure 1b. The specific features of this coordination controlled electrodeposition (CCED) scheme are that (i) the amount deposited is defined by the SAM through the number of coordination sites, (ii) the metal clusters formed are localized on top of the SAM, and (iii) the potential provides a precisely adjustable parameter for controlling the deposition kinetics.…”
Section: Introductionmentioning
confidence: 99%
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