Optical emission spectroscopy and Langmuir probe measurements have been performed under varying conditions, close to those previously optimized for high-pressure on-axis DC sputter deposition of YBa 2 Cu 3 O 7−x (Y123) films. The electron temperature and density of the plasma were mapped between the target and substrate. The aim of the investigation was to discern the effect of small variations of plasma environment on film growth and thus to enable precise tuning of the deposition conditions for Y123 and YBa 2 Cu 4 O 8 (Y124) films for different applications. The input parameters varied were: Ar-to-O 2 ratio in the sputtering gas and small additions of He, H 2 or H 2 O; total pressure; target composition (Y123 or Y124); and deposition temperature T s . The films were characterized by four-point and inductive T c measurements, x-ray diffractometry, Raman spectroscopy, Auger electron spectroscopy, Rutherford back scattering, x-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and x-ray energy dispersive spectrometry. A model has been developed to account for the structural peculiarities observed in the x-ray diffractograms of hydrogen-loaded Y123 films deposited in O 2 /Ar + H 2 O presented.