2010
DOI: 10.1088/0034-4885/73/3/036501
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Hybrid strategies in nanolithography

Abstract: Hybrid nanoscale patterning strategies combine the registration and addressability of conventional lithographic techniques with the chemical and physical functionality enabled by intermolecular, electrostatic and/or biological interactions. This review aims to highlight and to provide a comprehensive description of recent developments in hybrid nanoscale patterning strategies that enhance existing lithographic techniques or can be used to fabricate functional chemical patterns that interact with their environm… Show more

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Cited by 155 publications
(139 citation statements)
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References 584 publications
(649 reference statements)
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“…54,57,69 Also, monolayer defects and disorder can be induced by exothermic reactions. 70,71 The attachment chemistry also plays an important role. Selenols have previously been shown to outcompete sulfur for binding sites on Au{111}.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…54,57,69 Also, monolayer defects and disorder can be induced by exothermic reactions. 70,71 The attachment chemistry also plays an important role. Selenols have previously been shown to outcompete sulfur for binding sites on Au{111}.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .…”
Section: Published Inmentioning
confidence: 99%
“…However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 .…”
mentioning
confidence: 99%
“…in high-resolution lithography, 2 in the behavior of liquid crystal displays, 3 in organic photovoltaic [4][5][6] and in sensoring devices. 7 Also, a slow chain dynamics during annealing protocols of microphase separated structures in block copolymers films 8 is a limiting factor in developing cost-effective nanoscale patterning technologies.…”
Section: Introductionmentioning
confidence: 99%