2009
DOI: 10.1021/nl9004892
|View full text |Cite
|
Sign up to set email alerts
|

Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution

Abstract: We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying exte… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
108
0

Year Published

2010
2010
2018
2018

Publication Types

Select...
8
1
1

Relationship

0
10

Authors

Journals

citations
Cited by 150 publications
(108 citation statements)
references
References 20 publications
0
108
0
Order By: Relevance
“…Traditional techniques for patterning surfaces with spatial wettability contrast include vapor deposition (8), photolithography (3), and soft lithography (54,55). Although photolithography can only be used to pattern flat substrates, soft lithography using flexible molds or masks fabricated via photolithography can work on cylindrical or conical surfaces, i.e., curved surfaces with zero Gaussian curvature (54,55).…”
Section: Resultsmentioning
confidence: 99%
“…Traditional techniques for patterning surfaces with spatial wettability contrast include vapor deposition (8), photolithography (3), and soft lithography (54,55). Although photolithography can only be used to pattern flat substrates, soft lithography using flexible molds or masks fabricated via photolithography can work on cylindrical or conical surfaces, i.e., curved surfaces with zero Gaussian curvature (54,55).…”
Section: Resultsmentioning
confidence: 99%
“…Soft Nanoimprint Lithography is an inexpensive technique to fabricate high resolution nanopatterns on large areas with good reproducibility [6,9]. A flexible hybrid-PDMS working stamp comprising a 1 × 1 cm 2 array of 200 × 400 nm rectangular shaped pillars of 250 nm height is imprinted in a bilayer resist system consisting of a lift-off and nanoimprint layer.…”
Section: Nanoparticle Fabrication and Rotational Dynamics Measurementsmentioning
confidence: 99%
“…Thus far, there have been many methods developed to fabricate these arrays, including aluminum oxide (AAO) template technique [10,11], nano-imprint lithography [12], electron beam ligthography [13] and colloidal lithography [14][15][16], etc. Among these, colloidal lithography is an inexpensive, flexible, and efficient method for fabrication of periodically arranged nanostructured arrays on a large scale by using the mono-, or bi-layer organic colloidal crystals as templates, due to their interstitial geometry.…”
Section: Introductionmentioning
confidence: 99%