Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems

Oskirko, V. O.; Zakharov, A. N.; Pavlov, A. P.; Solovyev, A. A.; Semenov, V. A.; Работкин, С. В.

doi:10.1016/j.vacuum.2020.109670

Cited by 12 publications

(3 citation statements)

References 41 publications

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“…The maximum ion current density is observed at 5 µs and shorter pulses. As we note in the Introduction, this effect was observed earlier in [20,22,34,35]. Table 2 presents the main discharge parameters used in these works.…”

Section: Comparison Of Present and Previous Experimental Datasupporting

confidence: 53%

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Ion current density on the substrate during short-pulse HiPIMS

Oskirko

Kozhevnikov

Работкин

et al. 2023

Plasma Sources Sci. Technol.

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The probe method for the ion current density measurements and a theoretical calculations of the dynamics of neutral and charged plasma particles by ionization region model (IRM), are used to study high-power impulse magnetron sputtering (HiPIMS) short and ultra-short pulse discharges. The paper studies reasons for the increase in the average ion current density on the substrate at shorter pulses, when the average discharge power does not change. HiPIMS pulses are applied to the copper target at constant values of the average discharge power (1000 W) and the peak current (150 А), respectively, while the pulse time of the discharge voltage ranges from 4 to 50 µs. A power supply with low output inductance is designed to generate ultra-short pulses. It is shown that the discharge pulse time reduction leads to a multiple growth (from 2 to 7 mA/cm2) in the average ion current density onto the substrate and the growth in the peak intensity of Ar+, Cu+ and Cu2+ recorded by optical emission spectroscopy. A theoretical model of this effect is based on the spatially averaged IRM, which takes into account afterglow effects. According to theoretical calculations, the increase in the average ion current density onto the substrate is determined by the plasma dissipation in the ionized region after the pulse end. Also, explained is the decrease in the copper deposition rate from 180 to 60 nm/min with decreasing pulse time from 40 to 4 µs. A comparison of the experimental data and those obtained earlier, shows that the suggested dependences of the ion current density and deposition rate on the HiPIMS pulse time, are typical for discharge systems with different cathode materials and configurations, i.e., for single- and dual-magnetron systems. This indicates to a common nature of the phenomena observed and additionally confirms the results obtained.

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Section: Comparison Of Present and Previous Experimental Datasupporting

confidence: 53%

“…In [34], we used a hybrid HiPIMS + MFMS power supply and the average ion current density on the substrate 40% higher than in MFMS. In this case, the pulse time and peak current were 20 µs and 150 A, respectively.…”

Section: Comparison Of Present and Previous Experimental Datamentioning

confidence: 99%

Ion current density on the substrate during short-pulse HiPIMS

Oskirko

Kozhevnikov

Работкин

et al. 2023

Plasma Sources Sci. Technol.

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“…In our previous work [ 28 ] devoted to dual-HiPIMS, we developed a power supply with an independent control for bipolar pulse parameters. It was shown that the ion flux on the substrate was higher when depositing metal coatings at a constant average HiPIMS discharge power with short pulses (10–20 μs) [ 29 ].…”

Section: Introductionmentioning

confidence: 99%

Properties of TiAlN Coatings Obtained by Dual-HiPIMS with Short Pulses

et al. 2023

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The paper focuses on the dual high-power impulse magnetron sputtering of TiAlN coatings using short pulses of high power delivered to the target. The surface morphology, elemental composition, phase composition, hardness, wear resistance, and adhesive strength of TiAlN coatings with different Al contents were investigated on WC–Co substrates. The heat resistance of the TiAlN coating was determined with synchrotron X-ray diffraction. The hardness of the TiAlN coating with a low Al content ranged from 17 to 30 GPa, and its wear rate varied between 1.8∙10−6 and 4.9∙10−6 mm3·N−1·m−1 depending on the substrate bias voltage. The HF1–HF2 adhesion strength of the TiAlN coatings was evaluated with the Daimler–Benz Rockwell C test. The hardness and wear rate of the Ti0.61Al0.39N coating were 26.5 GPa and 5.2∙10−6 mm3·N−1·m−1, respectively. The annealing process at 700 °C considerably worsened the mechanical properties of the Ti0.94Al0.06N coating, in contrast to the Ti0.61Al0.39N coating, which manifested a high oxidation resistance at annealing temperatures of 940–950 °C.

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