2020
DOI: 10.1016/j.vacuum.2020.109670
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Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems

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Cited by 12 publications
(3 citation statements)
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“…The maximum ion current density is observed at 5 µs and shorter pulses. As we note in the Introduction, this effect was observed earlier in [20,22,34,35]. Table 2 presents the main discharge parameters used in these works.…”
Section: Comparison Of Present and Previous Experimental Datasupporting
confidence: 53%
See 1 more Smart Citation
“…The maximum ion current density is observed at 5 µs and shorter pulses. As we note in the Introduction, this effect was observed earlier in [20,22,34,35]. Table 2 presents the main discharge parameters used in these works.…”
Section: Comparison Of Present and Previous Experimental Datasupporting
confidence: 53%
“…In [34], we used a hybrid HiPIMS + MFMS power supply and the average ion current density on the substrate 40% higher than in MFMS. In this case, the pulse time and peak current were 20 µs and 150 A, respectively.…”
Section: Comparison Of Present and Previous Experimental Datamentioning
confidence: 99%
“…In our previous work [ 28 ] devoted to dual-HiPIMS, we developed a power supply with an independent control for bipolar pulse parameters. It was shown that the ion flux on the substrate was higher when depositing metal coatings at a constant average HiPIMS discharge power with short pulses (10–20 μs) [ 29 ].…”
Section: Introductionmentioning
confidence: 99%