2012
DOI: 10.1080/01496395.2012.659788
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Hybrid H2-Selective Silica Membranes Prepared by Chemical Vapor Deposition

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Cited by 9 publications
(4 citation statements)
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“…This explains why there are no Knudsen diffusion cells in all minimum acceptable grid models except for M2. From experimental results, the measured pore size varies from 0.50 to 0.85 nm, 33 which is much smaller than the appropriate pore size for Knudsen diffusion mechanism. This is possible evidence that Knudsen diffusion is not present in the membrane.…”
Section: ■ Results and Discussionmentioning
confidence: 96%
“…This explains why there are no Knudsen diffusion cells in all minimum acceptable grid models except for M2. From experimental results, the measured pore size varies from 0.50 to 0.85 nm, 33 which is much smaller than the appropriate pore size for Knudsen diffusion mechanism. This is possible evidence that Knudsen diffusion is not present in the membrane.…”
Section: ■ Results and Discussionmentioning
confidence: 96%
“…To improve the hydrothermal stability of silica membranes, various silicon compounds with different functional groups were studied such as silanes containing organic functional groups (methyl [13,14,15,16], propyl [15], hexyl [17], phenyl [15,18,19,20], and vinyl [21,22]) attached directly to a single silicon atom, and alkoxy siloxanes bridged with ≡Si–R–Si≡ structures (e.g., bis(triethoxysilyl)ethane) [23,24,25,26]. However, there were few reports focused on the number of the functional groups in a silicon compound.…”
Section: Introductionmentioning
confidence: 99%
“…There have been reports on the tailoring of the pore size of silica membranes by using the chemical structures of silica precursors via both the sol-gel route and CVD method. The precursors are various structured alkoxides: bridged alkoxides with ≡Si-R-Si≡ structure (e.g., bis(triethoxysilyl) ethane) [19,20], disiloxane alkoxides with ≡Si-O-Si≡ structure (e.g., hexamethyldisiloxane, hexaethoxy disiloxane, tetraethoxydimethyl disiloxane) [16,17,21], and silanes consisting of organic functional groups (methyl, propyl, hexyl, phenyl), which are directly attached to a single silicon atom [8,11,12,22,23]. For example, in our previous work, three series of silica membranes were prepared by the CVD method using tetramethoxysilane (TMOS), phenyltrimethoxysilane (PTMS), and diphenyldimethoxysilane (DPDMS, also called dimethoxydiphenylsilane (DMDPS) in the references [12,14,15]) as the silica precursors (the chemical structures of the precursors are provided in Figure 1) [12].…”
Section: Introductionmentioning
confidence: 99%