“…There have been reports on the tailoring of the pore size of silica membranes by using the chemical structures of silica precursors via both the sol-gel route and CVD method. The precursors are various structured alkoxides: bridged alkoxides with ≡Si-R-Si≡ structure (e.g., bis(triethoxysilyl) ethane) [19,20], disiloxane alkoxides with ≡Si-O-Si≡ structure (e.g., hexamethyldisiloxane, hexaethoxy disiloxane, tetraethoxydimethyl disiloxane) [16,17,21], and silanes consisting of organic functional groups (methyl, propyl, hexyl, phenyl), which are directly attached to a single silicon atom [8,11,12,22,23]. For example, in our previous work, three series of silica membranes were prepared by the CVD method using tetramethoxysilane (TMOS), phenyltrimethoxysilane (PTMS), and diphenyldimethoxysilane (DPDMS, also called dimethoxydiphenylsilane (DMDPS) in the references [12,14,15]) as the silica precursors (the chemical structures of the precursors are provided in Figure 1) [12].…”