2011
DOI: 10.1063/1.3655906
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Hug-like island growth of Ge on strained vicinal Si(111) surfaces

Abstract: We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfaces by scanning tunneling microscopy. Contrary to what is observed on the singular surface, three-dimensional Ge nanoislands form directly through the elastic relaxation of step-edge protrusions during the unstable step-flow growth. As the substrate misorientation is increased, the islands undergo a shape transformation which is driven by surface energy minimization and controlled by the miscut angle. Using finit… Show more

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Cited by 6 publications
(1 citation statement)
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“…In other words, the island acts as a trap for many clusters surrounding it. From the experimental side, previous investigations found a direct correlation between the minimum-strain energy path, as modeled by FE simulations, and the morphology of Ge islands grown on Si(111) substrates [18]. Here, scanning tunneling microscopy (STM) measurements were carried out in an ultrahigh vacuum chamber (p < 3×10 −11 Torr).…”
Section: Resultsmentioning
confidence: 98%
“…In other words, the island acts as a trap for many clusters surrounding it. From the experimental side, previous investigations found a direct correlation between the minimum-strain energy path, as modeled by FE simulations, and the morphology of Ge islands grown on Si(111) substrates [18]. Here, scanning tunneling microscopy (STM) measurements were carried out in an ultrahigh vacuum chamber (p < 3×10 −11 Torr).…”
Section: Resultsmentioning
confidence: 98%