1950
DOI: 10.2307/891582
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Howard Hanson's Autographs in the Sibley Music Library

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“…Appearance of broad peak at 2.54 ppm is due to -CH 3 of acetyl moiety. Figure 9(c) shows the NMR spectrum of poly(acetoxystyrene-co-acetylstyrene-costyrene) in CDCl 3 The broad peak at 2.54 is shifted to 2.19, which is due to acetoxy (CH 3 -COO) moiety. The small peak at 2.56 ppm is still present that is due to incomplete oxidation of acetyl groups.…”
Section: Resultsmentioning
confidence: 99%
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“…Appearance of broad peak at 2.54 ppm is due to -CH 3 of acetyl moiety. Figure 9(c) shows the NMR spectrum of poly(acetoxystyrene-co-acetylstyrene-costyrene) in CDCl 3 The broad peak at 2.54 is shifted to 2.19, which is due to acetoxy (CH 3 -COO) moiety. The small peak at 2.56 ppm is still present that is due to incomplete oxidation of acetyl groups.…”
Section: Resultsmentioning
confidence: 99%
“…Particularly, device generations will be produced with lithography systems employing shorter wavelengths by using KrF excimer laser light (248 nm), ArF excimer laser light (193 nm), and F 2 excimer laser light (157 nm) to produce patterns of size of 0.3 m or less. 3 Cresol-formaldehyde condensation polymers (ortho novalacs), with diazonaphthoquinone sulfonate esters as sensitizers, are used in photoresist formulations that use 436-, 405-, and 365-nm regions. The condensation polymerization of cresol with formaldehyde is difficult to control and results in a relatively low molecular weight polymer with number-average molecular weight (M n ) around 2500 and with a broad dispersity (20 -40).…”
Section: Introductionmentioning
confidence: 99%