We introduce a new scheme to realize suspended, multi-terminal graphene structures that can be current annealed successfully to obtain uniform, very high quality devices. A key aspect is that the bulky metallic contacts are not connected directly to the part of graphene probed by transport measurements, but only through etched constriction, which prevents the contacts from acting invasively. The device high quality and uniformity is demonstrated by a reproducibly narrow (n ~ 10 9 cm -2 ) resistance peak around charge neutrality, by carrier mobility values exceeding 10 6 cm 2 /V/s, by the observation of integer quantum Hall plateaus starting at 30 mT and of symmetry broken states at about 200 mT, and by the occurrence of a negative multi-terminal resistance directly proving the occurrence of ballistic transport. As these multi-terminal devices enable measurements that cannot be done in a simpler two-terminal configuration, we anticipate that their use in future studies of graphene-based systems will be particularly relevant.KEYWORDS: Multi-terminal suspended graphene, Ballistic transport, Negative resistance, Graphene bilayer, Quantum Hall effect.
2The investigation of the intrinsic electronic properties of graphene relies heavily on the study of transport through nano-electronic devices in which extrinsic disorder is minimized. 1-3 When produced through mechanical exfoliation of graphite, graphene and its multilayers usually exhibit an extremely high level of structural perfection and chemical purity, sufficient for the realization of very high-quality devices. However, eliminating the influence of external perturbations is very challenging because graphene-based materials have atomic scale thickness, so that nearby materials -the substrate or adsorbed molecules-can easily affect the carrier mobility and induce pronounced inhomogeneity in carrier density. Two main routes have been pursued to minimize these sources of extrinsic disorder. The first consists in realizing suspended devices, 1, 2 in which a graphene layer is hanging between source and drain electrodes without being in a direct contact with a substrate material. The second relies on the use of hexagonal boron-nitride (hBN) substrates, 3 which has been shown to enable the realization of high-quality graphene structures.Key experiments have been performed by using either one of these techniques, with each having its own advantages and limitations. The realization of the graphene devices on hBN, for instance, allows the use of large area flakes, which enables the fabrication of more complex device structures. [4][5][6][7][8] It also appears that graphene on hBN can be cleaned from unwanted adsorbates rather reproducibly, once the device fabrication technique is under control. 9 However, it has been shown in a series of beautiful experiments 10-13 that, when placed onto hBN, charge carriers in graphene are influenced by the electrostatic potentials generated by the B and N atoms. As a result, owing to the lattice mismatch between graphene and hBN, the su...