SUMMARYAn efficient 3D semiconductor device simulator is presented for a memory distributed multiprocessor environment using the drift-diffusion (D-D) approach for carrier transport. The current continuity equation and the Poisson equation, required to be solved iteratively in the D-D approach, are discretized using a finite element method (FEM) on an unstructured tetrahedral mesh. Parallel algorithms are employed to speed up the solution. The simulator has been applied to study a pseudomorphic high electron mobility transistor (PHEMT). We have carried out a careful calibration against experimental I-V characteristics of the 120 nm PHEMT achieving an excellent agreement. A simplification of the device buffer, which effectively reduces the mesh size, is investigated in order to speed up the simulations. The 3D device FEM simulator has achieved almost a linear parallel scalability for up to eight processors.