Holographic fabrication of 3D photonic crystals using silicon based reflective optics element

Abstract

We present a silicon based single optical element that is able to automatically generate desired laser beam polarizations and intensities for the holographic fabrication of woodpile-type photonic crystal templates. A polydimethylsiloxane (PDMS) mold based reflective optics element is fabricated for the generation of five-beam interferences where four beams are arranged four-fold symmetrically around a central beam. Silicon chips in the inner surfaces of the mold are used to reflect the circularly or elliptically polarized beam into four side beams that are linearly polarized with electric fields normal to the incident plane, and reduce their laser intensities. Photonic crystal templates are holographically fabricated in a photosensitive polymer through this silicon-on-PDMS based single optical element and single beam based configuration. ©2012 Optical Society of America

Holographic Fabrication and Optical Property of Graded Photonic Super-Crystals with a Rectangular Unit Super-Cell

“…Multiple-beam-based interference lithography has been used for the fabrication of a photonic crystal template [12][13][14][15][16][17][18][19]. The use of a phase mask or single reflection optical element has greatly reduced the complexity and has improved the mechanical stability of the optical setup [13][14][15][16][17][18][19]. Recently, SLM has been used as an electrically adjustable phase mask for the interference lithography [20][21][22][23][24][25][26][27].…”

Spatial light modulator based holographic fabrication of 3D spatially varying photonic crystal templates

“…22 By varying the number of beams and the polarization, intensity, phase, and angle of interference of those beams, different structures can be made, 18,19 but many bulk optical elements are needed to modify these parameters simultaneously in traditional holography setups. 11,12 Single beam and single optical element setups [13][14][15][16][17][23][24] can now holographically fabricate 2D and 3D photonic crystal templates with ease, and a single diffractive element setup has been shown to simultaneously fabricate photonic crystal templates with line defects. 25 The pattern integrated interference lithography technique effectively simultaneously fabricates photonic crystal templates with defects, 26 and is capable of embedding microcavity defects within a 3D photonic structure.…”

All-Optical Surface Micropatterning by Electric Field Intensity Gradient

“…The complete development of this method would open a wide range of possibilities in the production and utilization of optical element and would introduce new and innovative technologies. The obtained micro-and nanosurface patterns have already been demonstrated as optical polarizers [1], angular or spectral filters [2,3], optical transmission devices [4], data storage devices [5], and even photonic crystals [6][7][8][9]. They are also used in the production of tunable lasers, where the wavelength can be varied and depends on the geometrical parameters of gratings [10,11].…”