2007
DOI: 10.1016/j.actamat.2007.04.009
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Highly textured and twinned Cu films fabricated by pulsed electrodeposition

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Cited by 68 publications
(39 citation statements)
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“…For both substrate types, grain sizes generally decreased with increasing current density. Another study [74] of pulsed electrodeposited copper produced MC grains with twin spacings on the order of 10 nm and twin thicknesses of less than 50 nm. In this case, twin density increased and twin thickness and spacing decreased with increasing current density.…”
Section: Deposition Techniquesmentioning
confidence: 99%
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“…For both substrate types, grain sizes generally decreased with increasing current density. Another study [74] of pulsed electrodeposited copper produced MC grains with twin spacings on the order of 10 nm and twin thicknesses of less than 50 nm. In this case, twin density increased and twin thickness and spacing decreased with increasing current density.…”
Section: Deposition Techniquesmentioning
confidence: 99%
“…2), defect distribution, impurities, inclusions, precipitates, and residual stresses. There are many processing factors which affect the texture, grain size, and twin density of NC deposited films, including peak current density, bath pH, substrate crystal structure, substrate texture, and film thickness [74][75][76]. One study examining these effects compared NC copper films deposited on a bcc low carbon steel and an fcc austenitic stainless steel at varying current densities [75].…”
Section: Deposition Techniquesmentioning
confidence: 99%
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“…Numerous research efforts have been devoted towards the preparation of copper foils with high hardness and electrical conductivity. As part of these studies, highly textured and twinned copper foils with enhanced mechanical and electrical properties were synthesized by electrodepositionusing DC and PED techniques 23,[30][31][32][33][34][35][36][37] (various reports on usage of DC and PED to deposit copper in various forms with varied microstructure and texture are summarized in supporting information).…”
Section: Introductionmentioning
confidence: 99%
“…19,20) In the present work, the nanoscale lamellar Co-Cu alloy is annealed at 673-973 K to change its microstructure, and the relationships between the annealing temperature and the microstructure such as the lamellar spacing are examined. In addition, the effects of the nanoscale lamellar structure on the mechanical properties of Co-Cu alloy are investigated.…”
Section: Introductionmentioning
confidence: 99%