Highly Reproducible Organometallic Halide Perovskite Microdevices based on Top‐Down Lithography

Zhang, Nan; Sun, Wenzhao; Rodrigues, Sean P.; Wang, Kaiyang; Gu, Zhiyuan; Wang, Shuai; Cai, Wenshan; Xiao, Shumin; Song, Qinghai

doi:10.1002/adma.201606205

Cited by 149 publications

(149 citation statements)

References 49 publications

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“…It is easy to see that the deviations in different samples are much smaller than 0.1 nm. This value is close to the spectral resolution of our spectrometer and even comparable to the variation in MAPbBr 3 microdisks that are fabricated with electron-beam lithography and reactive plasma etching, [26] clearly demonstrating the high reproducibility of MAPbBr 3 perovskite microdisks on the same wafer.…”

Section: Uniform Wgm Laser In Perovskite Microdiskssupporting

confidence: 80%

“…[22,23] With the developments of nanofabrication technologies, distributed feedback Bragg (DFB) laser and circular microdisk lasers with precise wavelength control and wellpreserved optical gain have been experimentally realized by either inductively coupled plasma etching or nanoimprinting. [24][25][26] Associated with the developments of isolated devices, lead halide perovskites devices arrays have attracted considerable research attention due to their potential applications in coherent light arrays, charge-coupled device (CCD) arrays, and integrated optoelectronic circuits. [27][28][29][30] Basically, the technologies for perovskite arrays can be categorized into two groups: those that split the stock solutions by patterning the substrate or by covering it with a periodic slide.…”

Section: Doi: 101002/lpor201700234mentioning

confidence: 99%

“…The laser spectra from different microdisks are very close and the standard deviation in lasing wavelengths is smaller than 0.1 nm, which are comparable to the results of microdisks that are fabricated with electron-beam lithography. [26] In addition, a perovskite photodetector array that can utilize the entire area is experimentally demonstrated with a similar method.…”

Section: Doi: 101002/lpor201700234mentioning

confidence: 99%

“…Meanwhile, a bright green track appeared in the fluorescent microscope image (see inset-II in Figure 3a), consistent with the mode spacing very well. [26,39] With the further increase of the pumping power, the intensity of the narrow peaks increased dramatically and became much larger than the photoluminescence. The dependence of the output intensity, which corresponds to the mode whose peak position is at 553.4 nm, on the pumping density is summarized in Figure 3b, where a clear "S" shape can be observed.…”

Section: Optical Characterizationmentioning

confidence: 99%

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Chip‐Scale Fabrication of Uniform Lead Halide Perovskites Microlaser Array and Photodetector Array

Duan

Wang

et al. 2017

Laser & Photonics Reviews

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Lead halide perovskites have recently attracted attention due to their outstanding photoelectric properties. Hence, perovskite-based optoelectronic devices are widely studied. Herein, a simple solution-based one-step anti-solvent method to produce well-controlled and uniform CH 3 NH 3 PbBr 3 -based micro-devices is reported. It is confirmed that the size and mode numbers of the self-assembled microdisk cavities can be well controlled by modifying the size of the SiO 2 microdisks on the substrate or changing the concentration of the perovskite precursor. With this simple and robust method, the produced CH 3 NH 3 PbBr 3 microdisk arrays are extremely uniform in both their size distribution and emission spectra. Moreover, a perovskite photodetector array with fast rise (<8.3 ms) and decay (<8.3 ms) times was fabricated by periodically patterning the substrate. Based on the high controllability and high reproducibility of the patterned CH 3 NH 3 PbBr 3 microdisk arrays, this cost-effective and mass-manufacturable approach significantly increases the production yield of lead halide perovskite microdevices and boosts their ability to be used in practical applications.

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Section: Uniform Wgm Laser In Perovskite Microdiskssupporting

confidence: 80%

Section: Doi: 101002/lpor201700234mentioning

confidence: 99%

Section: Doi: 101002/lpor201700234mentioning

confidence: 99%

Section: Optical Characterizationmentioning

confidence: 99%

See 2 more Smart Citations

Chip‐Scale Fabrication of Uniform Lead Halide Perovskites Microlaser Array and Photodetector Array

Duan

Wang

et al. 2017

Laser & Photonics Reviews

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“…More specifically, a lithographic approach that can define desired perovskite patterns is highly needed in order to utilize these materials for the realization of integrated perovskite photonic devices. Zhang et al [25] demonstrated a different approach where PMMA layers were deposited on top of a MAPbBr 3 film and patterned using electron beam lithography (EBL) followed by dry Cl etching. First, the ability to cover the material (in our case perovskites) with a layer of resist and pattern it with sub-micrometer resolution using a scalable process.…”

mentioning

confidence: 99%

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Bar‐On

Brenner

Lemmer

et al. 2018

Adv Materials Technologies

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description of the efforts on developing perovskite lasers is given in recent review articles. [19][20][21][22] As the field advances, new approaches for patterning perovskite films are becoming essential. More specifically, a lithographic approach that can define desired perovskite patterns is highly needed in order to utilize these materials for the realization of integrated perovskite photonic devices. Generally speaking, effective lithographic patterning requires three main capabilities. First, the ability to cover the material (in our case perovskites) with a layer of resist and pattern it with sub-micrometer resolution using a scalable process. Second, employment of the patterned resist as an etch mask for complete removal of the unprotected perovskite film. Third, removal of the residual resist mask from the perovskite film. Since metal halide perovskites are unstable soluble materials that are sensitive to a variety of solvents and gases, [23] accomplishing all of the above steps without damaging the film is highly challenging. During the past few years, several attempts have been made in order to address this challenge. Lyashenko et al. [24] demonstrated the ability to pattern perovskites using photolithography followed by SF 6 etching. This approach was utilized to define patterns in photoresists on top of methyl-ammonium lead iodide (MAPbI 3 ) films but was limited to micrometer scale features due to diffraction effects in photolithography. In addition, the chemical reaction that was used in order to etch the material only modified the exposed areas chemically (converting the material to PbF 2 ) and did not remove the perovskite layer completely as desired from a proper etching technique. Zhang et al. [25] demonstrated a different approach where PMMA layers were deposited on top of a MAPbBr 3 film and patterned using electron beam lithography (EBL) followed by dry Cl etching. Although this method can potentially generate sub-micrometer features, it is based on a serial patterning technique (EBL) and is thus limited in terms of speed and cost. In addition, the scanning electron microscopy (SEM) images of the patterned surface suggest that the etching process left a residual layer on the surface (possibly PbCl 2 ) and was unable to remove the perovskite completely. A slightly different approach to pattern perovskite films, involving lift-off instead of etching, was recently successfully demonstrated. [26] However, this technique necessitates the evaporation of perovskite films and is not compatible with the standard spin-coating film preparation method which is simple, inexpensive, and renders these materials A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by cha...

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