2023
DOI: 10.1002/adma.202301321
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Highly Reliable Textile‐Type Memristor by Designing Aligned Nanochannels

Abstract: Information‐processing devices are the core components of modern electronics. Integrating them into textiles is the indispensable demand for electronic textiles to form close‐loop functional systems. Memristors with crossbar configuration are regarded as promising building blocks to design woven information‐processing devices that seamlessly unify with textiles. However, the memristors always suffer from severe temporal and spatial variations due to the random growth of conductive filaments during filamentary … Show more

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Cited by 6 publications
(2 citation statements)
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References 59 publications
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“…The working mechanism of the Ag/CABB/ITO memristor was analyzed by plotting logarithmic current versus logarithmic voltage for the Ag/Cs 2 AgBiBr 6 /ITO memristor (Figure S8e,f). , The aforementioned results reveal that although the Ag/CABB/ITO device exhibits a typical resistance switching behavior, the device performance, such as the on/off ratio, retention time, and cycling stability, still needs further improvements.…”
Section: Resultsmentioning
confidence: 99%
“…The working mechanism of the Ag/CABB/ITO memristor was analyzed by plotting logarithmic current versus logarithmic voltage for the Ag/Cs 2 AgBiBr 6 /ITO memristor (Figure S8e,f). , The aforementioned results reveal that although the Ag/CABB/ITO device exhibits a typical resistance switching behavior, the device performance, such as the on/off ratio, retention time, and cycling stability, still needs further improvements.…”
Section: Resultsmentioning
confidence: 99%
“…The device variability issue of filamentary memristors is the serious problem that needs to be solve urgently due to the randomness of ion migration and CFs. Up to now, various strategies have been considered for adjusting the formation of CFs for improving device uniformity, 459 including building ordered ion migration channel, 277,428,460–464 decreasing switching active layer thickness (ion migration length), 465,466 designing bilayer interface, 467–470 and electrode optimization. 471,472 In 2021, Han et al .…”
Section: Porous Crystalline Materials For Memoriesmentioning
confidence: 99%