2015 Symposium on VLSI Technology (VLSI Technology) 2015
DOI: 10.1109/vlsit.2015.7223684
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Highly reliable TaO<inf>x</inf> ReRAM with centralized filament for 28-nm embedded application

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Cited by 54 publications
(47 citation statements)
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“…[82][83][84] Both HfO x /TaO x -based RRAM show excellent resistive behavior. [85][86][87][88][89] Besides, they have the potential to form a multi-bit memory cell. 90,91 The typical unipolar and bipolar I-V characteristics of RRAM are shown in Figure 8A,B.…”
Section: Materials Selectionmentioning
confidence: 99%
See 1 more Smart Citation
“…[82][83][84] Both HfO x /TaO x -based RRAM show excellent resistive behavior. [85][86][87][88][89] Besides, they have the potential to form a multi-bit memory cell. 90,91 The typical unipolar and bipolar I-V characteristics of RRAM are shown in Figure 8A,B.…”
Section: Materials Selectionmentioning
confidence: 99%
“…116 Hayakawa et al demonstrated a TaO x RRAM with precise filament positioning by forming an encapsulated cell structure. 87 Li et al reported a reduction of variation and forming/set voltage can be achieved through enhanced electrical field by a pyramid-like electrode. 117 In addition, the set/reset voltage and corresponding low/high resistance states have mutual and accumulative influences on their counterparts as well as subsequent switching cycles.…”
Section: Uniformitymentioning
confidence: 99%
“…To address the sneak path issue, a select device connected in series with memristor is required, such as a transistor or a selector, which therefore forms a 1 transistor 1 resistor (1T1R) or 1 selector 1 resistor (1S1R) structure, or on‐state nonlinearity needs to be introduced into the memristive device itself . Figure (c) shows structure and die micrograph of a 2 Mb 1T1R memristor array using 28 nm technology . However, the introduction of transistors increased the feature size compared with passive arrays.…”
Section: Memristive Crossbar Arraymentioning
confidence: 99%
“…c) Structure and die micrograph of 2 Mbit 1T1R memristor array. Reproduced with permission . Copyright 2015, IEEE.…”
Section: Memristive Crossbar Arraymentioning
confidence: 99%
“…We distinguish between mediumdensity embedded memristor applications and high-density storage-class memory (SCM). Memristors in PUMA use 1T1R configuration which have been shown to have good manufacturability [50]. They are very different from SCM, where the selector transistor may be replaced with an in-line twoterminal selector device for higher density which complicates manufacturability.…”
Section: Related Workmentioning
confidence: 99%