2015
DOI: 10.1016/j.nanoen.2014.11.003
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Highly ordered catalyst-free InGaN/GaN core–shell architecture arrays with expanded active area region

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Cited by 49 publications
(54 citation statements)
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“…5a shows the edge between the non-polar (1-100) and semi-polar (1-101) planes which reveals slightly thicker QW width, other groups have explained this by possible different incorporation rates at the edge region due to gas flow i.e. flux shielding of the non-polar plane 52 . However unlike at the thicker QWs on the c-plane where there is a clear individually sharp luminescence peaks (RYG) seen in CL, these meeting points of the non-and semi-polar planes results in nearly no luminescence under CL investigation as seen in Fig.…”
Section: Resultsmentioning
confidence: 97%
“…5a shows the edge between the non-polar (1-100) and semi-polar (1-101) planes which reveals slightly thicker QW width, other groups have explained this by possible different incorporation rates at the edge region due to gas flow i.e. flux shielding of the non-polar plane 52 . However unlike at the thicker QWs on the c-plane where there is a clear individually sharp luminescence peaks (RYG) seen in CL, these meeting points of the non-and semi-polar planes results in nearly no luminescence under CL investigation as seen in Fig.…”
Section: Resultsmentioning
confidence: 97%
“…2(d)) would have similar mechanism with VLS, because the nanowires have a high aspect ratio of $100, which can not be realized by using normal SAG. [7][8][9][16][17][18]20,22,23 The underlying growth mechanism in this case would be neither pure VLS 1,2,12,13,24-27,29 nor pure SAG, 7-9,16-18,22,23 because of the factors: (1) for VLS, metal droplet can normally be observed at the tip of nanowires, but in our case there is no droplet at the tip of nanowires (Fig. 2(d)) or needles (Fig.…”
Section: Discussionmentioning
confidence: 99%
“…For MOCVD growth of GaN nanostructures, there has two main methods, i.e., vaporliquid(solid)-solid growth with metal catalyst (VLS) 1,2,12,13,[24][25][26][27]29 and catalyst-free anisotropic-growth on patterned substrate (i.e., selective area growth (SAG)). [7][8][9][16][17][18][19][20][21][22][23] However, for the nanowires with high aspect ratio (length/diameter > 35), it is difficult to be grown via SAG method [7][8][9][16][17][18]22,23,39 without the use of high silane ux 18,20 or complex pulsed-growth mode. 24 While, for the micro-rods of low aspect ratio (i.e., microscale-trunk rods), there is few report that they can be grown via VLS method.…”
Section: 11mentioning
confidence: 99%
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