2020
DOI: 10.1364/ol.404012
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Highly efficient optical antenna with small beam divergence in silicon waveguides

Abstract: Optical antennas are key components in optical phased arrays for light detection and ranging technology requiring long sensing range and high scanning resolution. To achieve a narrow beam width in the far-field region, antenna lengths of several millimeters or more are required. To date, such long antennas have been impossible to achieve in silicon waveguides because currently demonstrated technologies do not allow accurate control of grating strength. Here, we report on a new type of surface-emitting silicon … Show more

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Cited by 28 publications
(9 citation statements)
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“…The grating attenuation coefficient (α) of the antenna is determined through FDTD simulations by evaluating the power input to the grating antenna (P in ) and the remaining power (P out ) at the end of 35 periods. The formula [35]…”
Section: Numerical Results and Discussionmentioning
confidence: 99%
“…The grating attenuation coefficient (α) of the antenna is determined through FDTD simulations by evaluating the power input to the grating antenna (P in ) and the remaining power (P out ) at the end of 35 periods. The formula [35]…”
Section: Numerical Results and Discussionmentioning
confidence: 99%
“…Surface gratings as optical antennas are designed to radiate the light out of the chip, facilitating free-space beam shaping and steering, which is desired for surging applications in LIDARs or free-space optical communications. Both very long (mm-scaled) andultra-short (μm-scaled) surface gratings with weak and strong radiation can be advantageously utilized as efficient optical antennas in one-dimensional (1-D) or two-dimensional (2-D) OPAs [35][36][37][38]. Figure 2a show a schematic view the optical nano-antenna implemented on a 220 nm thick SOI platform.…”
Section: Silicon Antennasmentioning
confidence: 99%
“…To achieve such requirements it is required to fabricate features below 10 nm which are hard to achieve with high precision even with electron-beam lithography processes. To overcome this problem, a subwavelength segmented core OPA topology has been proposed recently [15,16], enabling precise control of the modal confinement and loading of evanescently coupled radiative elements. Nonetheless, feature sizes as small as 80 nm are still required to fabricate OPAs using this topology.…”
Section: Introductionmentioning
confidence: 99%