The synthesis, structural characterization, and
reactivity of tantalum complexes with chelating imido−amido ligands are reported. The highly bent imido
Cp* =
η5-C5Me5), with a TaN−C bond angle of 116.3(4)°, was
synthesized from Cp*TaCl4 and the lithiated
bis(silylamino)biphenyl
(C6H3Me)2(NLiSiMe3)2
(3). Compound 4 undergoes reactions with
electrophiles at the nucleophilic imido
nitrogen atom. The methyl
reacts with xylyl isonitrile to give an
insertion product, 6, which was structurally characterized.
Addition of MeI to 5 gives a cationic diamide
tantalum
the ionic structure of which was confirmed by
X-ray
crystallography. Reactions of 4 and 5 with
unhindered silanes result in addition of the silane Si−H bond across
the
TaN double bond. Addition of PhSiH3 to 4
and 5 gave the
respectively. The crystal structure of
9 was determined.
Compounds 8 and 9 are unstable and decompose
via elimination of HSiMe3. In the presence of
CH2Cl2 and
PhSiH3,
4 was slowly converted to another hydrido
A mechanism
for this transformation, involving a sequence of silane
addition/elimination reactions, is proposed. X-ray
structural
characterization of 12 revealed the presence of a
nonclassical bonding interaction between the hydride ligand and
a
neighboring silyl group, leading to a short H−Si contact of
1.86(4) Å and a distorted pentagonal bipyramidal
geometry
at silicon. Reactions of PhSiH3 and
(CH2)3SiH2 (silacyclobutane)
with 5 follow second-order kinetics, and an
inverse
deuterium isotope effect of
k
H/k
D = 0.78(1)
for the addition of PhSiH3 to 5 was observed.
The elimination of
HSiMe3 from 9 was found to follow a first-order
rate law with approach to equilibrium (K
H =
0.025(2) mol/L) and
exhibit an inverse isotope effect of
k
H/k
D = 0.85(2).
A study of the temperature dependence of the first-order
rate
constant for HSiMe3 elimination from 9 provided
the activation parameters ΔH
⧧=
25.5(3) kcal/mol and ΔS
⧧
=
−0.3(1.0) cal/(mol·K). These findings are interpreted in
terms of a mechanism involving slow, rate-determining
formation of pentacoordinate silicon intermediates, coupled with a fast
hydride shift between Ta and Si.