“…For example, at room temperature, n‐type Bi 2 Te 3 ‐based thin films were reported to have high ZT s of > 2.2 and 1.6, [ 139,140 ] n‐type Ag 2 Se thin film exhibited a high ZT of 1.2, [ 141 ] and p‐type BST, Sb 2 Te 3 , and SrTiO 3 thin films showed high ZT s of >1.5. [ 142–144 ] A few fabrication methods, such as solution method, [ 187,188 ] spray pyrolysis, [ 189 ] electrodeposition, [ 190 ] pulsed laser deposition, [ 191 ] chemical and electrochemical deposition, [ 192 ] magnetron sputtering, [ 143,193,194 ] flash evaporation, [ 195 ] atomic layer deposition, [ 196 ] hot wall epitaxy, [ 197 ] thermal evaporation, [ 198 ] brush plating, [ 199 ] and bath deposition, [ 200 ] have been used to fabricate TE films. Figure a illustrates the fabrication of Bi 2 Te 3 ‐based thick films and devices using a brush printing method.…”