High Uniformity 6-Inch InGaP Epitaxial Growth

Abstract

The growth of 6-inch In0.485Ga0.515P has been examined in this study. The effects of growth temperature, the V/III ratio, and the H2 total flow on solid composition, growth rate, and crystal quality have been systematically investigated and discussed. Additionally, the effect of growth conditions on doping efficiency has been investigated. Finally, the relationship between electrical uniformity, optical uniformity, and the growth conditions of the 6-in epitaxial layer is discussed. At a growth temperature of 600 °C and a V/III of 250, a high uniformity 6-in InGaP epitaxial layer with an electrical uniformity of 0.33% and optical uniformity of 0.03% was produced. InGaP was grown by the metal-organic chemical vapor deposition method in an Aixtron 2800G4 reactor. High resolution X-ray diffraction (HRXRD), photoluminescence (PL), sheet resistance, electrochemical capacitance-voltage (ECV), and the Hall effect were used to characterize the characteristics of InGaP epitaxial layers.