Abstract:In this study, high -transmittance attenuated Phase Shift Masks(HT -Att-PSMs) have been investigated to satisfy the requirements of 20±5% transmittance and 180° phase shift at the exposure wavelength of 193 nm for ArF laser (248nm for KrF laser) and less than 40% transmittance at the inspection wavelength of 248 nm(365 nm for KrF laser).Chromium aluminum oxynitride has been studied as a new candidate material for HT -Att-PSM. At first, optimum conditions of composition and thickness were shown by n(refractive … Show more
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