2007
DOI: 10.1117/12.712381
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High-throughput polarization imaging for defocus and dose inspection for production wafers

Abstract: Advances in lithography create a unique challenge for process window control with defects inspection tools. As the technology moves towards smaller line widths and more complicated structures, the sensitivity requirements for some process defects become higher, such as defocus and dose defects at 50nm or lower technology nodes. Currently automated macro inspection tools are used to detect a wide range of macro defects in the litho area, such as coating defects, particles, scratches, as well as the process defe… Show more

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“…We experiment with the methods that have been used to develop techniques for computer vision for both surface shape geometry recovery [4], [3] and surface quality inspection [6], [5]. In the former case, we use images of objects with known geometry and refractive index, where we test the consistency of the estimated zenith and azimuth angles with ground truth.…”
Section: Introductionmentioning
confidence: 99%
“…We experiment with the methods that have been used to develop techniques for computer vision for both surface shape geometry recovery [4], [3] and surface quality inspection [6], [5]. In the former case, we use images of objects with known geometry and refractive index, where we test the consistency of the estimated zenith and azimuth angles with ground truth.…”
Section: Introductionmentioning
confidence: 99%
“…Although humans are insensitive to polarisation, it is a useful addition to colour and intensity information for computer vision applications [16]. Polarisation imaging has been used to develop a variety of techniques in computer vision, including surface quality inspection [15], [8], [10], shape recovery [1], [2], [9], [11] and material characterisation [17], [7]. Polarisation can also be used to infer information concerning the reflectance properties of surfaces.…”
Section: Introductionmentioning
confidence: 99%