High‐Throughput Chemical Vapor Deposition System and Thin‐Film Silicon Library

Wang, Qi; Liu, Fengzhen; Han, Daxing

doi:10.1002/marc.200300151

Cited by 12 publications

(8 citation statements)

References 19 publications

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“…2(a), uses chemical vapor deposition (CVD) to produce composition spreads by positioning the CVD precursor inlets close to the substrate and allowing diffusive, gas phase intermixing to create the composition gradient on the substrate in the region between the two sources. 19,20 The local film growth rate is dependent on the precursors, their flux to the substrate surface and the substrate temperature. This method is relatively simple and does allow codeposition of components for intimate mixing.…”

Section: Methods For Preparation Of Csafsmentioning

confidence: 99%

Apparatus for deposition of composition spread alloy films: The rotatable shadow mask

Fleutot¹,

Miller²,

Gellman³

2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Composition spread alloy films (CSAFs) are materials libraries used for high throughput investigations of multicomponent materials such as alloys, AxByC1−x−y. CSAFs are prepared such that the alloy film has a lateral spatial gradient in its local composition; thus, they include a set of alloy samples with a distribution of compositions that spans a continuous region of composition space (x,y). A tool based on the shadow mask concept has been developed for generating composition gradients, but modified to allow rotation of the shadow mask during CSAF deposition. The tool allows deposition of CSAFs containing up to four elements with rotatable shadow masks between each of the four electron beam evaporation sources and the deposition substrate. This allows codeposition of any combination of up to four components. In the case of the ternary AxByC1−x−y CSAFs, the three components can be deposited such that the resulting CSAF spans the entire ternary alloy composition space (x = 0 → 1, y = 0 → 1 − x) and, furthermore, contains all three binary alloys AxB1−x, AxC1−x, and BxC1−x (x = 0 → 1) and all three pure components. The innovation of the rotatable shadow masks also allows preparation of CSAFs that magnify selected regions of the composition space (x = xmin → xmax, y = ymin → 1 − x). Herein, we describe the design and performance of this new CSAF deposition tool and assess its merits and limitations with respect to other methods for CSAF preparation.

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Section: Methods For Preparation Of Csafsmentioning

confidence: 99%

Apparatus for deposition of composition spread alloy films: The rotatable shadow mask

Fleutot¹,

Miller²,

Gellman³

2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…However, that is not the intent of this report. Instead, we will describe our CSAF fabrication methods as an example and provide the following citations of papers describing the various other methods of CSAF fabrication 20–23,26,27,37–48…”

Section: Materials Libraries (Csafs)mentioning

confidence: 99%

Alloy corrosion and passivation spanning composition space

et al. 2023

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“…For example, the CVD reactor design of Gladfelter [11,16] features three feed tubes in a triangular arrangement across the substrate; a different single-source precursor is fed through each tube, generating compositional spreads of three metal dioxides over the substrate. In Wang [13,14,15], thickness graded films of hydrogenated silicon were deposited in a hot-wire CVD system featuring a mask and motorized shutter; control of the shutter speed was used to create strips of graded films over the substrate. Hyett and Parkin [7] describe a crossflow reactor configuration where separate precursor inlet nozzles are used to produce films with composition gradients of tungsten and titanium oxides and to likewise generate films with varying ratios of TiO 2 rutile/anatase phases.…”

Section: Combinatorial Cvdmentioning

confidence: 99%

Full-wafer mapping and response surface modeling techniques for thin film deposition processes

Leon

Adomaitis

2009

Journal of Crystal Growth

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Isr develops, applies and teaches advanced methodologies of design and analysis to solve complex, hierarchical, heterogeneous and dynamic problems of engineering technology and systems for industry and government.Isr is a permanent institute of the university of maryland, within the a. James clark school of engineering. It is a graduated national science foundation engineering research center. AbstractComputational techniques for representing and analyzing full wafer metrology data are developed for chemical vapor deposition and other thin-film processing applications. Spatially resolved measurement data are used to produce "virtual wafers" that are subsequently used to create response surface models for predicting the full-wafer thickness, composition, or any other property profile as a function of processing parameters. Statistical analysis tools are developed to assess model prediction accuracy and to compare the relative accuracies of different models created from the same wafer data set. Examples illustrating the use of these techniques for film property uniformity optimization and for creating intentional film-property spatial gradients for combinatorial CVD applications are presented.

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High‐Throughput Chemical Vapor Deposition System and Thin‐Film Silicon Library

Cited by 12 publications

References 19 publications

Apparatus for deposition of composition spread alloy films: The rotatable shadow mask

Apparatus for deposition of composition spread alloy films: The rotatable shadow mask

Alloy corrosion and passivation spanning composition space

Full-wafer mapping and response surface modeling techniques for thin film deposition processes

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