High-throughput and high-precision laser micromachining with ps-pulses in synchronized mode with a fast polygon line scanner

Jaeggi, B.; Neuenschwander, Beat; Zimmermann, Martin; Penning, Lars; deLoor, R.; Weingarten, K. J.; Oehler, Andreas

doi:10.1117/12.2037379

Cited by 22 publications

(10 citation statements)

References 26 publications

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“…Scientific applications such as NL filamentation in air for control of lightning discharges may be possible [29] where dynamic control of phase, polarisation and orbital angular momentum of ultrahigh peak power pulses at high repetition rate would be beneficial. Future expansion of industrial applications in ultra high throughput laser marking, patterning and machining are likely when high power laser sources are combined with polygon scanners [30] able to achieve scan speeds on a substrate s > 200ms - 1 . When combined with a high energy, high average power laser system and optimised CGHs creating uniform or variable intensity spots [31] massively parallel-beam laser microstructuring for industrial applications will be possible.…”

Section: Discussionmentioning

confidence: 99%

Investigation of the thermal and optical performance of a spatial light modulator with high average power picosecond laser exposure for materials processing applications

Zhu

Whitehead

Perrie

et al. 2018

J. Phys. D: Appl. Phys.

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Spatial light modulators (SLM's) addressed with Computer Generated Holograms (CGH's) can create structured light fields on demand when an incident laser beam is diffracted by a phase CGH. The power handling limitations of these devices based on a liquid crystal layer has always been of some concern. With careful engineering of chip thermal management, we report the detailed optical phase and temperature response of a liquid cooled SLM exposed to picosecond laser powers up to

= 220W at 1064nm. This information is critical for determining device performance at high laser powers. SLM chip temperature rose linearly with incident laser exposure, increasing by only 5C at

= 220W incident power, measured with a thermal imaging camera. Thermal response time with continuous exposure was 1-2 seconds. The optical phase response with incident power approaches 2 radians with average power up to

= 130W, hence the operational limit, while above this power, liquid crystal thickness variations limit phase response to just over  radians. Modelling of the thermal and phase response with exposure is also presented, supporting experimental observations well. These remarkable performance characteristics show that liquid crystal based SLM technology is highly robust when efficiently cooled. High speed, multi-beam plasmonic surface micro-structuring at a rate R = 8cm 2 s-1 is achieved on polished metal surfaces at

= 25W exposure while diffractive, multi-beam surface ablation with average power

=100W on stainless steel is demonstrated with ablation rate of 4mm 3 min-1. However, above 130W, first order diffraction efficiency drops significantly in accord with the observed operational limit. Continuous exposure for a period of 45 minutes at a laser power of

= 160W did not result in any detectable drop in diffraction efficiency, confirmed afterwards by the efficient parallel beam processing at

= 100W. Hence, no permanent changes in SLM phase response characteristics have been detected. This research work will help to accelerate the use of liquid crystal Spatial light modulators for both scientific and ultra high throughput laser-materials micro-structuring applications.

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Section: Discussionmentioning

confidence: 99%

Investigation of the thermal and optical performance of a spatial light modulator with high average power picosecond laser exposure for materials processing applications

Zhu

Whitehead

Perrie

et al. 2018

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

= 220W at 1064nm. This information is critical for determining device performance at high laser powers. SLM chip temperature rose linearly with incident laser exposure, increasing by only 5C at

= 25W exposure while diffractive, multi-beam surface ablation with average power

= 160W did not result in any detectable drop in diffraction efficiency, confirmed afterwards by the efficient parallel beam processing at

show abstract

“…The measured depth values were then compared with the developed model based on Equation (10). The values for energy penetration depth ( =8.9 nm) and the ablation threshold ( = 0.055 J/cm²) that were used for the calculations were taken from [26]. The calculated results are plotted as After laser patterning experiments, the mean depths, ℎ , of the fabricated structures were measured using confocal microscopy.…”

Section: Validation Of the Simulation Modelmentioning

confidence: 99%

Development of an Analytical Model for Optimization of Direct Laser Interference Patterning

et al. 2020

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Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processing parameters have to be carefully selected. In this work, an analytical model was developed and verified by experimental data, which allows calculating the morphological properties of periodic structures as a function of most relevant laser-processing parameters. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy, and repetition rate. The model was developed for the structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel by means of picosecond DLIP (10 ps), using a laser source operating at a 1064 nm wavelength. The results showed a difference of only 10% compared to the experimental results.

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“…High-power ultrafast laser sources are extensively used in applications ranging from pump sources in nonlinear frequency conversion 1 2 3 4 to metrology 5 6 7 and material processing 8 9 10 11 . Master oscillator power amplifier (MOPA) sources based on fiber amplifiers (FA) are especially interesting due to large gain, small foot-print, robustness and efficient heat removal, which alleviates substantially the mode quality degradation brought about by thermo-optic effects at high average powers 12 .…”

mentioning

confidence: 99%

Accurate modeling of high-repetition rate ultrashort pulse amplification in optical fibers

Lindberg

Zeil

Malmström

et al. 2016

Sci Rep

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A numerical model for amplification of ultrashort pulses with high repetition rates in fiber amplifiers is presented. The pulse propagation is modeled by jointly solving the steady-state rate equations and the generalized nonlinear Schrödinger equation, which allows accurate treatment of nonlinear and dispersive effects whilst considering arbitrary spatial and spectral gain dependencies. Comparison of data acquired by using the developed model and experimental results prove to be in good agreement.

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High-throughput and high-precision laser micromachining with ps-pulses in synchronized mode with a fast polygon line scanner

Cited by 22 publications

References 26 publications

Investigation of the thermal and optical performance of a spatial light modulator with high average power picosecond laser exposure for materials processing applications

Investigation of the thermal and optical performance of a spatial light modulator with high average power picosecond laser exposure for materials processing applications

Development of an Analytical Model for Optimization of Direct Laser Interference Patterning

Accurate modeling of high-repetition rate ultrashort pulse amplification in optical fibers

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