High throughput and dense sampling metrology for process control

Sun, Lei; Kohyama, Tsunehito; Takeda, Kazuki; Nozawa, Hiroto; Asakawa, Yuji; Kagalwala, Taher; Lobb, Granger; Mont, Frank W.; Dai, Xintuo; Pal, Shyam Chand; Wang, Wenhui; Kye, Jongwook; Goodwin, Francis

doi:10.1117/12.2258623

Cited by 2 publications

(1 citation statement)

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“…The next generation computing devices that evolve towards mobile-oriented, cloud-based, and high speed-driven network environments require manufacturing of ever-decreasing features to meet the demands of advanced technologies including integrated circuits based on advanced transistors logic gates and quantum computing devices based on qubit logic gates [1][2][3]. Dimensional metrology for characterization of these nanoscale features occupies an essential place in the manufacturing process of those nanoscale devices [4,5]. Optical dimension measurement methods have unique benefits of nondestructive character, higher measurement speed, and relatively lower cost, comparing to other major measurement methods such as scanning electron microscopy (SEM) or atomic force microscopy (AFM) [6,7].…”

Section: Introductionmentioning

confidence: 99%

Effect of partial coherence on dimensional measurement sensitivity for DUV scatterfield imaging microscopy

et al. 2019

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Optical scatterfield imaging microscopy technique which has the capability of controlling scattered fields in the imaging mode is useful for quantitative nanoscale dimensional metrology that yields precise characterization of nanoscale features for semiconductor device manufacturing process control. To increase the sensitivity in the metrology using this method, it is required to optimize illumination and collection optics that enhance scatterfield signals from the nanoscale targets. Partial coherence of the optical imaging system is used not only for enhancing image quality in the traditional microscopy or lithography but also for increasing the sensitivity of the scatterfield imaging microscopy. This paper presents an empirical investigation of the effect of partial coherence on measurement sensitivity using a deep ultraviolet scatterfield imaging microscope platform that uses a 193 nm excimer laser as a source and a conjugate back focal plane as a unit for controlling partial coherence. Dimensional measurement sensitivity is assessed through analyzing scatterfield images measured at the edge area of periodic multiline structures with nominal linewidths ranging 44-80 nm on a Molybdenum Silicide (MoSi) photomask. Intensities scattered from the targets under the illuminations with various partial coherence factors and two orthogonal polarizations are assessed with respect to sensitivity coefficient. The optimization of partial coherence factor for the target dimension is discussed through the sensitivity coefficient maps.

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