2010
DOI: 10.1166/jnn.2010.1678
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High Temperature Stability of Multicomponent TiAlSiN and CrAlSiN Coatings

Abstract: The high temperature oxidation behavior of TiAlSiN and CrAlSiN coatings was studied. These coatings were deposited on silicon substrates by using a cathodic-arc deposition system with lateral rotating arc cathodes. Titanium, chromium and Al88Si12 cathodes were used for the deposition of TiAlSiN and CrAlSiN coatings. All the deposited Ti(0.49)Al(0.44)Si(0.07)N, Ti(0.41)Al(0.51)Si(0.08)N and Cr(0.50)Al(0.440Si(0.06)N coatings showed B1-NaCl crystal structure and possessed nano-grain sizes of 6-8 nm. For the high… Show more

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Cited by 11 publications
(3 citation statements)
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“…The CrAlSiN coatings show high wear resistances in dry machining of Ti-6Al-4V alloys and excellent cutting performance [2]. Furthermore, given the high oxidation temperature and the excellent chemical stability at elevated temperatures that they present, these coatings are also being applied and tested in high temperature applications [3][4][5][6]. More recently, applications for the marine environment were also studied, which is why attention is paid to its resistance to corrosion in environments saturated with NaCl [7].…”
Section: Introductionmentioning
confidence: 99%
“…The CrAlSiN coatings show high wear resistances in dry machining of Ti-6Al-4V alloys and excellent cutting performance [2]. Furthermore, given the high oxidation temperature and the excellent chemical stability at elevated temperatures that they present, these coatings are also being applied and tested in high temperature applications [3][4][5][6]. More recently, applications for the marine environment were also studied, which is why attention is paid to its resistance to corrosion in environments saturated with NaCl [7].…”
Section: Introductionmentioning
confidence: 99%
“…Mastery of new semiconductor devices and structures cannot be made without solving the problems of metallization and contact systems (Pedersen et al, 2015). The point is that the role of metallization in modern structures of micro-and nanoelectronics is becoming a key (Chang and Chang, 2010;Okabe et al, 2014;Brincker et al, 2018a;Brincker et al, 2018b;Zhao et al, 2019).…”
Section: Introductionmentioning
confidence: 99%
“…To improve the oxidation resistance of these films, ternary materials were investigated, such as Ti-Al-N [3,4] and Cr-Al-N [3,5], and they are now widely used in commercial applications. Further increase in the oxidation resistance was achieved by the addition of Si [6][7][8] or combining nitrides of Ti, Al and Cr in quaternary compounds. The latter concept has been found to have promising performance compared to that of ternary films.…”
Section: Introductionmentioning
confidence: 99%