2005
DOI: 10.1007/s00542-004-0412-5
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High temperature resistant antireflective moth-eye structures for infrared radiation sensors

Abstract: The Fresnel reflections occurring at the interfaces of a silicon wafer shall be drastically reduced by reactive ion beam etching of so called moth-eye structures into both surfaces of the wafer. This kind of impedance matching is advantageous to a multilayer interference system when the silicon wafer shall be used as an entrance window for high temperature thermopile infrared radiation sensors and emitters. The transmission was measured to be increased by more then 60%, compared to a polished silicon wafer.

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Cited by 49 publications
(32 citation statements)
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“…[1][2][3][4] In the AR structures, the pillars on the surface have to be configured in a tapered shape to vary the apparent refractive index of the surface gradually. [1][2][3][4] In the AR structures, the pillars on the surface have to be configured in a tapered shape to vary the apparent refractive index of the surface gradually.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4] In the AR structures, the pillars on the surface have to be configured in a tapered shape to vary the apparent refractive index of the surface gradually. [1][2][3][4] In the AR structures, the pillars on the surface have to be configured in a tapered shape to vary the apparent refractive index of the surface gradually.…”
Section: Introductionmentioning
confidence: 99%
“…Using IFL, moth eye structures can be written on different surface shapes as concave or freeform optical surfaces and even on top of diffraction gratings or on top of microlens arrays (see Figure 6, left). Additionally, these complex microstructures can be dry etched into many different materials, e.g., silicon [20], reducing the Fresnel loss of about 30% from each side of a silicon wafer for a high-temperature sensor application. These moth eye gratings are of fundamental importance, as they can be used in many optical devices as, e.g., with lenses needed for microscopy, photography, semiconductor illumination, and many others.…”
Section: Grating Types According To Applicationmentioning
confidence: 99%
“…While LWIR coatings are available, incorporating them into the above process flow could be challenging. An alternative is to use sub-wavelength antireflective structures [41] where the silicon is etched to create a series of isolated posts whose dimensions are well below the wavelength of the radiation of interest. A simple proof of principle is shown in Fig.…”
Section: Fabrication and Processingmentioning
confidence: 99%