High temperature oxidation resistance of physical vapor deposited Hf-Si-B2±z thin films

Laser Ablation Sample Preparation for Grain Boundary Analysis of H in Atom Probe Tomography

“…These coatings exhibit a good high-temperature oxidation resistance and are of interest for the aviation industry. With this sample preparation method, atom probe tips were milled directly in the Wafer and investigated with atom probe tomography revealing the cluster behavior of Si [4]. Figure 1a and b demonstrate a small part of a wafer with the coating on top and a more focused image on one tip after the laser ablation step.…”