High temperature oxidation resistance of CrAlSiN coatings synthesized by a cathodic arc deposition process

Chang, Yin-Yu; Chang, Chi Lung; Wang, Da-Yung; Yang, Shieh Yueh; Wu, Weite

doi:10.1016/j.jallcom.2007.06.084

Cited by 81 publications

(31 citation statements)

References 36 publications

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“…It was also found that a minor sub-peak appeared at 397.7 eV, which was recognized as the Si 3 N 4 phase. Similar results with Si 3 N 4 bonds at 397.2-397.9 eV have been reported in published papers [22,36]. One phenomenon that needs to be pointed out is that an increase of Al-Si content led to the N1s or Cr2p peaks in the Cr-Al-Si-N coatings deviating, as compared with the Al-Si-free original Cr-N bonding energy.…”

Section: Xrd and Xps Analysissupporting

confidence: 88%

“…This indicated the presence of the Cr(Al)N crystalline phase, and the peak, with bonding energy at 77.8 eV, was regarded as Cr-N bonds. As shown in Figure 7c, the peaks for the Cr2p spectra centered at 575.5 eV and 584.8 eV were recognized as Cr2p3/2 and Cr2p1/2, respectively, which were in accordance with Cr(Al)N bonds [36]. The N1s spectra in Figure 7d demonstrated a main characteristic peak at 396.5 eV, which corresponded to the Cr(Al)N bonds.…”

Section: Xrd and Xps Analysismentioning

confidence: 73%

“…The rebounding phenomenon of the roughness in the film at the value of 1 kW was ascribed to the recrystallization and ion-bombardment effects at higher power sputtering. [34,36]. We divided the Al-Si target power into two different zones, as seen in Figure 6.…”

Section: Morphology and Microstructure Analysesmentioning

confidence: 99%

“…We divided the Al-Si target power into two different zones, as seen in Figure 6. The first zone is the Al-Si target power from 0 to 0.4 kW, [34,36]. We divided the Al-Si target power into two different zones, as seen in Figure 6.…”

Section: Morphology and Microstructure Analysesmentioning

confidence: 99%

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Microstructure, Mechanical, Oxidation and Corrosion Properties of the Cr-Al-Si-N Coatings Deposited by a Hybrid Sputtering System

et al. 2017

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CrN and Cr-Al-Si-N coatings were deposited on SUS304 and Si-wafers by a hybrid coating system. The Cr and Al-Si target were connected to the cathode arc ion plating (AIP) and high power impulse magnetron sputtering (HiPIMS), respectively. Various Al and Si contents in the coatings were obtained by changing the power of Al-Si target from 0 to 1 kW. The results demonstrated a face-centered cubic structure in all of the coatings. With increasing Al-Si target power, both the density and mean diameter of the macroparticles on the coating surface declined. As Al and Si contents increased, the microstructure of the Cr-Al-Si-N coatings evolved from a dense column structure, to a finer grain column structure, and then to a compact granular-like structure. The hardness of the coatings increased from 21.5 GPa for the pure CrN coating, to a maximum value of~27 GPa for the Cr-Al-Si-N coating deposited at 0.4 kW, which was mainly attributed to the solid solution strengthening and increased residual stress. The addition of Al and Si contents led to enhanced wear resistance against alumina balls at both room and elevated temperatures. Meanwhile, the Cr-Al-Si-N coatings also exhibited an excellent resistance to high-temperature oxidation at 800 and 1000 • C, and improved corrosion resistance, as compared with CrN coatings.

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Section: Xrd and Xps Analysissupporting

confidence: 88%

Section: Xrd and Xps Analysismentioning

confidence: 73%

Section: Morphology and Microstructure Analysesmentioning

confidence: 99%

Section: Morphology and Microstructure Analysesmentioning

confidence: 99%

See 2 more Smart Citations

Microstructure, Mechanical, Oxidation and Corrosion Properties of the Cr-Al-Si-N Coatings Deposited by a Hybrid Sputtering System

et al. 2017

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“…One of the important application fields of (Cr,Al,Si)N is the production of thin film nanocomposites for protection of tools used for punching of perforated sheets [1], forming dies [2], high end spindle bearings [3] and moulds. The benefit of the Cr--Al--Si--N thin film nanocomposites is their high hardness [4][5][6][7][8][9] and a good corrosion resistance [8,10,11]. The formation of Cr--Al--Si--N nanocomposites is facilitated by a limited solubility of aluminium and silicon in the elementary cell of CrN, which leads to the phase segregation and to the coexistence of Cr 1ÀxÀy Al x Si y N, AlN and silicon nitride in the nanocomposites.…”

Section: Introductionmentioning

confidence: 99%

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Rafaja¹,

Wüstefeld

Kutzner

et al. 2010

Zeitschrift für Kristallographie

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Cathodic arc evaporation / Unbalanced magnetron sputtering / High power impulse magnetron sputtering / X-ray diffraction / Transmission electron microscopy / Ab initio calculations Abstract. A combination of microstructure analysis and ab initio calculations helped us to describe the interplay between the microstructure of Cr--Al--Si--N thin film nanocomposites and the ordering of the magnetic moments in the chromium-rich phase of (Cr,Al)N. The microstructure of the Cr--Al--Si--N nanocomposites was modified through the degree of ionisation of the deposited species in three physical vapour deposition processes -cathodic arc evaporation, unbalanced magnetron sputtering and high power impulse magnetron sputtering. According to the results of the ab initio calculations, the magnetic ordering was concluded from the expansion of the elementary cell and from the change of the crystal anisotropy of the elastic constants of (Cr,Al)N; these microstructure features were obtained from X-ray diffraction experiments. The microstructure of the Cr--Al--Si--N nanocomposites was furthermore characterised using the combination of X-ray diffraction and transmission electron microscopy with high resolution in order to obtain information about the phase composition of the thin films, distribution of individual elements and the crystallite size.

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Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

2021

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To increase the erosion and corrosion resistance of compressor blades, hard (Cr,Al,Si)N coatings are used. Physical vapor deposition (PVD) is a well‐known method for the deposition of nitride hard coatings. The application of pulse technique in power supply of conventional PVD technologies like magnetron sputtering shows a great potential for increasing the durability and lifetime of different tools and components. However, one disadvantage of conventional PVD is the line‐of‐sight characteristic. This is eliminated by means of the convection‐driven transport mechanism in high speed physical vapor deposition (HS‐PVD) technology, based on gas flow sputtering. Herein, the influence of gas flow sputtering with bipolar pulsed direct current (DC) power supply on coating properties and impact resistance of (Cr,Al,Si)N/substrate compound is investigated. Thereby, (Cr,Al,Si)N coatings are deposited onto X3CrNiMo13‐4 by HS‐PVD using continuous DC and bipolar pulsed DC supply. Nanoindentation analyses show an increase in indentation hardness using pulsed DC compared with continuous DC. Moreover, the lowest imprint depth and degree of cohesive and adhesive failures are observed in this case. These release a high potential for pulsed power supply in HS‐PVD, resulting in denser morphology, higher hardness and impact resistance compared with DC.

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High temperature oxidation resistance of CrAlSiN coatings synthesized by a cathodic arc deposition process

Cited by 81 publications

References 36 publications

Microstructure, Mechanical, Oxidation and Corrosion Properties of the Cr-Al-Si-N Coatings Deposited by a Hybrid Sputtering System

Microstructure, Mechanical, Oxidation and Corrosion Properties of the Cr-Al-Si-N Coatings Deposited by a Hybrid Sputtering System

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

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