High temperature annealing effects on spectral, microstructural and laser damage resistance properties of sputtered HfO2 and HfO2-SiO2 mixture-based UV mirrors

Abromavičius, Giedrius; Kičas, Simonas; Buzelis, Rytis

doi:10.1016/j.optmat.2019.109245

Cited by 34 publications

(22 citation statements)

References 35 publications

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“…Our results for the long annealing times are in qualitative agreement with this finding. We did not observe the very prominent increase of the LIDT as reported in [24], which is not surprising as we annealed at a lower temperature of 500°C instead of the 600 and 700°C marked as the optimal "high-temperature" annealing by Abromavicius et al Indeed the observed Scherrer-size indicates that HfO 2 crystallites are either very small or they are highly strained [38]. Irrespective of the origin of the line-broadening, the layers did not reach a relaxed, coarse-grained state.…”

Section: Laser-damage Testingcontrasting

confidence: 65%

“…Irrespective of the origin of the line-broadening, the layers did not reach a relaxed, coarse-grained state. We also found an intermediate decrement of the LIDT values, which is not reported in [24] and worth further investigation. One explanation for the small Scherrersize is high stress, this according to our own experience leads to low LIDT [39].…”

Section: Laser-damage Testingsupporting

confidence: 59%

“…Thermal treatment to cure defects and/or reduce stress levels is a well-known method for improving the laserdamage threshold (e.g. [23,24,36,37]). However, typical annealing treatments stay well below the crystallization limits, as the presence of grain boundaries leads to an increase in the scattered light.…”

Section: Laser-damage Testingmentioning

confidence: 99%

“…Nevertheless, in the case of hafnia, it is also proven that crystallization [24] is an efficient method of increasing the single layer LIDT and multilayer coatings. Our results for the long annealing times are in qualitative agreement with this finding.…”

Section: Laser-damage Testingmentioning

confidence: 99%

“…Liu et al investigated the effect of heat treatment on thick IBS hafnia layers deposited on fused silica and single crystalline silicon substrates and reported a stress reduction accompanying the partial crystallization [23]. A recent publication by Abromavicius et al [24] revealed that crystallization of IBS-HfO 2 can lead to higher LIDT due to stress reduction and/or better thermal management.…”

Section: Introductionmentioning

confidence: 99%

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Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Balogh-Michels

Stevanovic

Borzì³

et al. 2021

J. Eur. Opt. Soc.-Rapid Publ.

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In this work, we present our results about the thermal crystallization of ion beam sputtered hafnia on 0001 SiO2 substrates and its effect on the laser-induced damage threshold (LIDT). The crystallization process was studied using in-situ X-ray diffractometry. We determined an activation energy for crystallization of 2.6 ± 0.5 eV. It was found that the growth of the crystallites follows a two-dimensional growth mode. This, in combination with the high activation energy, leads to an apparent layer thickness-dependent crystallization temperature. LIDT measurements @355 nm on thermally treated 3 quarter-wave thick hafnia layers show a decrement of the 0% LIDT for 1 h @773 K treatment. Thermal treatment for 5 h leads to a significant increment of the LIDT values.

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Section: Laser-damage Testingcontrasting

confidence: 65%

Section: Laser-damage Testingsupporting

confidence: 59%