1992
DOI: 10.1049/el:19920215
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High speed waveguide-integrated photodiodes grown by metal organic molecular beam epitaxy

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Cited by 16 publications
(4 citation statements)
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“…Measurements of the power absorbed are made by integrating the resistive heating term over the entire absorbing region as calculated from the simulations. The resulting simulations produced very similar, periodic results to [9]. An optimum layer thickness of 1.8 µm was chosen for the absorbing layer to maximize absorption, reduce the sensitivity to thickness variations, and increase fabrication yield.…”
Section: Designmentioning
confidence: 85%
See 1 more Smart Citation
“…Measurements of the power absorbed are made by integrating the resistive heating term over the entire absorbing region as calculated from the simulations. The resulting simulations produced very similar, periodic results to [9]. An optimum layer thickness of 1.8 µm was chosen for the absorbing layer to maximize absorption, reduce the sensitivity to thickness variations, and increase fabrication yield.…”
Section: Designmentioning
confidence: 85%
“…Photodetectors are analyzed using the COMSOL Multiphysics finite element analysis software package to simulate optical propagation and absorption of 1550 nm radiation through the structure. It is expected that absorption from waveguide into the absorbing layer (InGaAs) is dependant on its thicknesses and that there is an ideal dimension for this intrinsic layer [9]. The simulations follow the structure shown in Figure 3 with a varying InGaAs thickness.…”
Section: Designmentioning
confidence: 89%
“…It is expected that absorption from waveguide into the absorbing layer (InGaAs) will be resonant in nature and dependent on its thicknesses. 16 A two dimensional model of our structure was constructed (see Figure 2) with the assumption that that absorption in the InGaAs layer would be the dominant loss mechanism. Absorption was modeled as resistive heating in the COMSOL simulations.…”
Section: Dmmentioning
confidence: 99%
“…As one of the key components, semiconductor photodetectors based on InP materials, which offer the advantages of low dark current, high-efficiency and highspeed operation, have been widely studied for long-wavelength optical fiber communication applications. [1][2][3][4][5][6][7] Therefore, although p-i-n photodetectors do not have internal gain, a combination of a photodetector with an amplification device, such as high electron mobility transistor (HEMT) or heterojunction bipolar transistor (HBT), in optoelectronic integrated circuits (OEIC's) has led high-sensitivity optical receivers to operate for high-rate data transmission. [8][9][10][11][12] In order to achieve these characteristics, it requires a precise control of the thickness and concentration of different epitaxial layers.…”
Section: Introductionmentioning
confidence: 99%