High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Wang, Lin; Aristone, Flavio; Goettert, Jost; Kong, J R; Bradshaw, Keith; Christenson, Todd R.; Desta, Yohannes M.; Jin, Yoonyoung

doi:10.1117/12.478268

Cited by 6 publications

(7 citation statements)

References 1 publication

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“…Absorption contrast (commonly referred to as contrast) is commonly used to evaluate the suitability of an x-ray mask for patterning a given thickness resist layer. The contrast c is defined as the ratio of the bottom dose d B to the top dose d T under the absorber, namely c = d B /d T [2]. Calculations with the DoseSim code, which allows us to simulate the exposure features of x-ray lithography [15], indicate that the masks with a 10.7 µm absorber provide a contrast of 77, for the 870 µm thick SU-8 layers.…”

Section: Resultsmentioning

confidence: 99%

“…The LIGA (a German acronym for lithography, electroplating and molding) process is an important technology for the production of high aspect ratio micro-and nanostructures [1,2]. The technological core of LIGA is x-ray lithography with synchrotron radiation (SR).…”

Section: Introductionmentioning

confidence: 99%

“…Electron beam lithography is one of the most widely used direct writing techniques for x-ray mask fabrication. However, e-beam lithography is typically performed on relatively thin resist layers (less than 1 µm), which do not provide sufficient contrast for hard x-ray lithography [2]. To make a sufficiently thick absorber layer (say 10-20 µm), conventional x-ray mask production has to use several lithography steps in two or more exposures [4].…”

Section: Introductionmentioning

confidence: 99%

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The fabrication of x-ray masks using proton beam writing

Yue¹,

Chiam²,

Ren³

et al. 2008

J. Micromech. Microeng.

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We have developed a simplified method of fabricating x-ray masks for deep x-ray lithography by using proton beam writing (PBW) without subsequent soft x-ray copying steps. Combining direct PBW and subsequent electroplating, x-ray masks with gold absorber patterns of up to 11 µm height and with vertical and smooth sidewalls were fabricated. The smallest size in the absorber pattern is less than 0.5 µm in this work. The masks were used for x-ray lithography with synchrotron radiation, and 870 µm SU-8 structures with smooth sidewalls were produced. This fabrication method is promising to be an important alternative to conventional methods for x-ray mask making.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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The fabrication of x-ray masks using proton beam writing

Yue¹,

Chiam²,

Ren³

et al. 2008

J. Micromech. Microeng.

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“…The desired pattern is transferred on the resist either through UV lithography or by direct writing a pattern using electron beam, laser beam or collimated X-ray beam. 141 Actual absorber pattern is obtained by depositing or etching the high Z material in the resist-patterned area. X-ray masks made of titanium membrane (∼2 μm) with gold have produced the sidewall surface roughness in the range of 10–20 nm.…”

Section: Deep X-ray Lithographymentioning

confidence: 99%

Micromanufacturing: A review—Part I

Jain

Dixit

Paul

et al. 2014

Proceedings of the Institution of Mechanical Engineers, Part B:

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Micromanufacturing processes are expanding in their length and breadth as long as the related research and development (R&D) activities and applications are concerned. Products are getting miniaturized and their performance efficiency is getting enhanced by the addition of micro/nanofeatures and devices. In the set of these two articles (Part I and Part II), an attempt has been made to review the latest R&D activities of the selected micromanufacturing processes. This article (Part I) deals with a review of the literature related to attrition (subtractive, or machining and finishing) processes (both types—traditional and advanced) including microturning, micromilling, microdrilling, abrasive jet micromachining, laser beam micromachining, electrochemical micromachining, magnetorheological finishing, abrasive flow finishing, magnetic abrasive finishing, ion beam micromachining and so on. Apart from the subtractive processes, an overview of the X-ray lithography has also been presented. An attempt has been made to report some applications to help the readers to evolve more new applications of these processes. At the end of different sections/subsections, some research areas have been identified, which would hopefully fill the gaps between the theoretical analysis, experimental work and applications.

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“…Besides simple, cylindrical structures efforts are focusing on fabricating more complex structures including multi-level (Jian et al 2003) and ''quasi 3D'' patterns as well as taller (Turner et al 2003) (millimeter and higher) and smaller (Wang et al 2003) (sub-micrometer) HARM structures, and also on special materials for selected applications (Wiche2003).…”

Section: Introductionmentioning

confidence: 99%

Direct LIGA service for prototyping: status report

Loechel¹,

Goettert

Desta

2006

Microsyst Technol

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Since the early 1990s a variety of applications ranging from precision metallic, ceramic, or polymeric parts to complex devices for micro-fluidic and microoptic applications have been discussed with the assumption that LIGA can either make a significant contribution or is the sole technology able to make these products. The question today is, have individual LIGA groups or even the entire LIGA community achieved this goal? Despite major investments, a lot of hard work from many students and researchers, and some promising ''prototypes'', a true mass product made by direct LIGA, i.e., using X-ray lithography and electroplating, has still not entered the market. This paper will briefly present the current status of direct-LIGA technology and discuss some examples of commercialization efforts as well as prospects for high-volume production.

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High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Cited by 6 publications

References 1 publication

The fabrication of x-ray masks using proton beam writing

The fabrication of x-ray masks using proton beam writing

Micromanufacturing: A review—Part I

Direct LIGA service for prototyping: status report

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