1998
DOI: 10.1134/1.1187352
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High-resolution x-ray diffraction study of InAs-GaAs superlattices grown by molecular-beam epitaxy at low temperature

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Cited by 12 publications
(10 citation statements)
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“…The excess arsenic concentration was determined from the shift of the diffraction peak of the AlGaAsSb film due to the annealing [10][11][12]. According to the X ray dif fraction analysis, the concentration of arsenic point defects in LT AlGaAs(Sb) was 7.6 × 10 19 cm -3 .…”
Section: Samples and Experimental Techniquementioning
confidence: 99%
“…The excess arsenic concentration was determined from the shift of the diffraction peak of the AlGaAsSb film due to the annealing [10][11][12]. According to the X ray dif fraction analysis, the concentration of arsenic point defects in LT AlGaAs(Sb) was 7.6 × 10 19 cm -3 .…”
Section: Samples and Experimental Techniquementioning
confidence: 99%
“…805 is 20% lower. Such behavior of μ H is due to partial smearing of the InGaAs/InAs heterointerface and an increase in the degree of roughness of the heterointerface [30]. Thus, to attain the best mobility of electrons in the CQW, it is necessary to improve the morphological properties of nanoinserts and to control the degree of smoothness of the interface at the atomic level.…”
Section: Resultsmentioning
confidence: 99%
“…[1][2][3][4][5] The x-ray rocking curve technique, which is a form of HRXRD, measures the sample reflecting power as a function of the angle between the sample surface and the incident x-ray beam and provides information on layer thickness, composition, and strain for epitaxial layers. When applied to simple structures such as a single heterolayer consisting of three or less elemental constituents on a known substrate, the thickness, composition and strain of the overlayer can be obtained with great accuracy simply by using basic formulations of Bragg's law.…”
Section: High-resolution X-ray and Transmission Electron Microscopic mentioning
confidence: 99%