Abstract:Negative tone chemically amplified i-line resists possess several advantages compared to conventional DNQ-Novolak resists. These advantages include excellent lithographic performance at a fast, tunable photospeed, high transparency, high thermal flow stability and improved etch resistance. An additional advantage of using negative resists for logic applications is that the difference in CD for various features (US, Iso L, CH, Trenches, Posts) at a fixed dose is small relative to conventional positive resists1,… Show more
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