1999
DOI: 10.1007/s003390051493
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High rate deep channel ablative formation by picosecond-nanosecond combined laser pulses

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Cited by 55 publications
(17 citation statements)
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“…Additionally employed were samples of ceramics of Si3N4. The list of laser radiation sources included Ti:Sa laser operating at the wavelength of 790 nm and repetition rate of 1 kHz allowing variation of the output pulse duration from 100 fs to 5 ps, Nd:YAP laser delivering 300 ps pulses, high repetition rate nanosecond Nd:YAG laser (up to 5 kHz) and an original Nd:YAG laser generating trains of nanosecond pulses with an equivalent ultra-high repetition rate of 150÷200 kI-Iz [8]. According to Fig.…”
Section: Experimental Schematics and Conditionsmentioning
confidence: 99%
“…Additionally employed were samples of ceramics of Si3N4. The list of laser radiation sources included Ti:Sa laser operating at the wavelength of 790 nm and repetition rate of 1 kHz allowing variation of the output pulse duration from 100 fs to 5 ps, Nd:YAP laser delivering 300 ps pulses, high repetition rate nanosecond Nd:YAG laser (up to 5 kHz) and an original Nd:YAG laser generating trains of nanosecond pulses with an equivalent ultra-high repetition rate of 150÷200 kI-Iz [8]. According to Fig.…”
Section: Experimental Schematics and Conditionsmentioning
confidence: 99%
“…The key properties are beam quality and output power as well as compact design. The combination of enhanced capabilities for tailoring the optical energy density with new laser systems and improved processing strategies using the advanced picosecond and femtosecond lasers [17] leads to further improvement.…”
Section: Solid-state Pulsed Lasersmentioning
confidence: 99%
“…The key properties are beam quality and output power -improved simultaneously at high efficiency-as well as compact design. The combination of enhanced capabilities for tailoring the optical energy density with new laser systems and improved processing strategies using the advanced ps-lasers as well as lasers with only a few ns pulse duration [22] leads to further im provement. Actual developments enable new applications like marking in the middle of transparent materials as well as polishing of metal parts (Figure 4.5), micro machining of transparent material (Figures 4.7 and 4.8) with higher form accuracy and also generation of EUV radiation at 13 nm wavelength for next generation lithography.…”
Section: Overview Of Lasers and Application Fieldsmentioning
confidence: 99%